- COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME
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A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), [in-line-formulae]R1bR2cSi (OR3)4-a??(A)[/in-line-formulae] wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.
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- SILANE COUPLING AGENT, PROCESS FOR THE PREPARATION OF A SILANE COUPLING AGENT, USE OF SAID SILANE COUPLING AGENT IN A COMPOSITE OR ON A SUBSTRATE, NANOPARTICLES AND USE THEREOF IN A COATING.
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The invention relates to a novel silane coupling agent according to Formula (1) below, wherein Y = a chain composed of aliphatic, cyclic or aromatic groups, furthermore comprising an additional reactive group chosen from the series of a secondary amine, a amine linked to a secondary or tertiary carbon atom or a hydroxyl group linked to a primary, secondary or tertiary carbon atom. R, R'= CH3 or C2H5, n = 3-15, q = 1, 2 or 3 and p = 3-q. The invention also relates to the use of the coupling agent according to the invention in a composite, for example in a dental application. The invention further relates to a process for the preparation of a silane coupling agent by reacting, at a temperature lower than 150° C, a carbonyl bislactamate with a silane compound containing at least one amino group. The invention moreover relates to nano particles, in particular nano silicate particles, obtained by hydrolysis of the coupling agent according to the above formula in the presence or absence of tetraethoxysilane and to the use of such particles in a coating.
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