Reaction of Hexachlorodisilane with Trichloroethynylsilane and 2-Propynyl Chloride in the Gas Phase
Reaction of acetylenic compounds (trichloroethynylsilane and 2-propynyl chloride) with hexachlorodisilane in the gas phase at 450-520°C was studied. Main products of the reaction were identified, and a mechanism of their formation was proposed. It was shown that of the two reaction centers of 2-propynyl chloride (C=≡C and C-Cl) only the C-Cl bond is involved in reaction with dichlorosilylenes generated from hexachlorodisilane.