Chemistry Letters Vol.36, No.6 (2007)
709
rise to a more ordered smectic phase (smectic X) of 2. This phase
could not be distinguished from smectic C only by POM images,
but this smectic X phase appears to come from the difference in
the orientation of end-capped hexyl chains.
Thin film of 1, obtained by drop-casting on a SiO2 substrate
from a CS2 solution followed by annealing below crystal-LC
phase-transition temperature (150 ꢃC), showed multiple X-ray
diffraction patterns (Figure S2).5 The most significant Bragg
mismatch (ꢂ0:3 eV) with the work function of gold metal,
resulting in large contact resistance. The FET mobility estimated
from the saturation region is 1:5 ꢄ 10ꢁ2 cm2 Vꢁ1 sꢁ1 (at VD
¼
ꢁ40 V, W ¼ 10000 mm, L ¼ 20 mm) with an on/off ratio of
104. On the other hand, devices of 2 showed only linear region
of output characteristics under an identical condition with 1.
The estimated linear mobility is 4:3 ꢄ 10ꢁ4 cm2 Vꢁ1 sꢁ1 (at
VD ¼ ꢁ40 V, W ¼ 5000 mm, L ¼ 10 mm) with an on/off ratio
of 102. The present FET performance is comparable to those
of thermally grown oligothiophene thin films. The solution proc-
ess dramatically decrease device fabrication time in comparison
with vacuum deposition, and is suitable for industrial applica-
tion. It should be noted that the reported devices upon herein
were fabricated by simple drop-casting and annealing under nor-
mal atmospheric conditions. Self-organization (molecular order)
of the present compounds from various concentrated solutions
should be investigated to improve film morphology for the
enhancement of the FET performance. Further manipulation in
or above LC phase temperature to improve the FET performance
is also expected.
˚
diffraction peaks (d-spacing of 20.6 A) up to the ninth order were
recorded, indicating well-defined molecular layers, but multiple
patterns imply the co-existence of grains with different molecu-
lar orientations. These orientations would be associated with
self-organization corresponding to the layered structure of smec-
˚
tic C phase. The d-spacing of 20.6 A corresponds to half of the
˚
molecular length (ca. 40 A) of 1. Therefore, the molecules are
largely tilted (ca. 60ꢃ) from the normal direction to the substrate.
Thin film transistors were fabricated by drop casting from
CS2 or toluene solutions of 1 and 2 onto bottom gate, bottom
contact HMDS (Hexamethyldisilazane)-treated SiO2 substrates
with photographically patterned gold source and drain elec-
trodes. Devices were annealed at 100 ꢃC under air (below the
LC phase temperature) prior to measurement (SEM images are
shown in Figure S3). All the devices exhibited p-channel behav-
ior with current modulation. The FET characteristics of thin
film of 1 from CS2 solution are shown in Figure 2. The output
characteristics show typical linear and saturated regions together
with nonohmic behavior at low VD region, probably due to
In summary, the new solution-processable LC quaterthio-
phenes 1 and 2 have been prepared. We have demonstrated that
TFTs made by even simple drop-casting film of 1 and 2 show
competing FET properties to dry-processed oligothiophene
devices. The ordered film structure of 1 without the LC phase
assistance indicates that the LC molecules are attractive candi-
dates applicable for the low-cost fabrication technique like the
inkjet printing.
V
G
This work was partially supported by a Grant-In-Aid for
Scientific Research (No. 16GS0219) from the Ministry of
Education, Culture, Sports, Science and Technology of Japan.
-30
-25
-20
-15
-10
-5
-40 V
(a)
-30 V
References and Notes
1
93, 6137; Z. Bao, A. Dodabalapur, A. J. Lovinger, J. Appl. Phys.
1996, 69, 4108; J. Chang, B. Sun, D. W. Breiby, M. M. Nielsen,
-20 V
-10 V
2
T. I. Solling, M. Giles, I. McCulloch, H. Sirringhaus, Chem. Mater.
¨
0 V
0
10 V
0
-10
-20
/ V
-30
-40
3
I. Mcculloch, M. Heeney, C. Bailey, K. Genevicius, I. Macdonald,
M. Shkunov, D. Sparrowe, S. Tierney, R. Wagner, W. Zhang,
M. L. Chabinyc, R. J. Kline, M. D. Mcgehee, M. F. Toney,
C. H. T. Chlon, J. Sweelssen, H. F. M. Schoo, S. Setayesh, W. M.
Hardeman, C. A. Martin, D. M. de Leeuw, J. J. P. Valeton, C. W.
M. Bastiaansen, D. J. Broer, A. R. Popa-Merticaru, S. C. J. Meskers,
K. Genevicius, M. Shkunov, D. Sparrowe, S. Tierney, I. McCulloch,
VD
-4
10
0.007
0.006
0.005
0.004
0.003
0.002
0.001
0
(b)
VD = -40 V
-5
10
-6
10
-7
10
4
H. Zhang, S. Shiino, A. Shishido, A. Kanazawa, O. Tsutsumi, T.
H. Chen, C. Chen, L. Huang, C. Kuo, K. Chen, C. Ong, K. Wong,
-8
10
5
6
7
Supporting Information is available electronically on the CSJ-Jour-
D. M. de Leeuw, M. M. J. Simenon, A. R. Brown, R. E. F.
10
0
-10
-20
-30
-40
VG / V
Figure 2. Output (a) and transfer (b) characteristics of a TFT
fabricated with 1 as a semiconductor channel layer.