Tris(tert-butoxy)silanol

Base Information

• Chemical Name: Tris(tert-butoxy)silanol
• CAS No.: 18166-43-3
• Molecular Formula: C12H28O4Si
• Molecular Weight: 264.437
• Hs Code.: 2915900090
• European Community (EC) Number: 801-265-2
• NSC Number: 243646
• DSSTox Substance ID: DTXSID30311474
• Nikkaji Number: J1.241.314I
• Wikidata: Q82061202
• Mol file: 18166-43-3.mol

Synonyms:18166-43-3;Tris(tert-butoxy)silanol;Tri-t-butoxysilanol;Tri-tert-butyl hydrogen orthosilicate;hydroxy-tris[(2-methylpropan-2-yl)oxy]silane;Silicic acid (H4SiO4), tris(1,1-dimethylethyl) ester;MFCD00271024;TRI-TERT-BUTOXYSILANOL;Tri-tert-butylhydrogenorthosilicate;NSC243646;tris(t-butoxy)silanol;SCHEMBL525601;DTXSID30311474;Tris(tert-butoxy)silanol, 99.999%;NSC 243646;NSC-243646;AS-69209;CS-0006242;Tris(tert-butoxy)silanol, packaged for use in deposition systems

Chemical Property of Tris(tert-butoxy)silanol

Chemical Property:

• Vapor Pressure: 0.00145mmHg at 25°C
• Melting Point: 63-65 °C(lit.)
• Refractive Index: 1.436
• Boiling Point: 263.4 °C at 760 mmHg
• PKA: 11.78±0.53(Predicted)
• Flash Point: 113.1 °C
• PSA: 47.92000
• Density: 0.947 g/cm³
• LogP: 2.85960
• Storage Temp.: below 5° C
• Sensitive.: moisture sensitive
• Hydrogen Bond Donor Count: 1
• Hydrogen Bond Acceptor Count: 4
• Rotatable Bond Count: 6
• Exact Mass: 264.17568590
• Heavy Atom Count: 17
• Complexity: 204

Purity/Quality:

98% ^*data from raw suppliers

Tri-t-butoxysilanol (99.999%-Si) PURATREM ^*data from reagent suppliers

Safty Information:

• Statements: 36/37/38
• Safety Statements: 22-24/25

MSDS Files:

SDS file from LookChem

Total 1 MSDS from other Authors

Useful:

• Canonical SMILES: CC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C
• Uses: Silicon oxide source for rapid atomic layer deposition to prepare various nanolaminates. Precursors Packaged for Depositions Systems Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH3)2)4) for vapor phase deposition of hafnium silicate glass films. Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.

Technology Process of Tris(tert-butoxy)silanol

There total 12 articles about Tris(tert-butoxy)silanol which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 93.0%

tri-tert-butoxy-chloro-silane (18105-64-1) → tris(tert-butoxy)silanol (18166-43-3)

Guidance literature:

With 1H-imidazole; water; In diethyl ether; at 20 ℃; for 18h; Reagent/catalyst;

DOI:10.1002/hlca.201700298

Reference yield:

(tert-butoxy)B[tris(tert-butoxy)siloxy]2 (502635-70-3) → tris(tert-butoxy)silanol (18166-43-3) + isobutene (115-11-7,15220-85-6) + tert-butyl alcohol (75-65-0)

Guidance literature:

aluminium trichloride; In ⁽²⁾H₈-toluene; thermolysis at 180°C;

DOI:10.1021/ic0205482

Reference yield:

B[tris(tert-butoxy)siloxy]3 (502635-71-4) → tris(tert-butoxy)silanol (18166-43-3) + isobutene (115-11-7,15220-85-6) + tert-butyl alcohol (75-65-0)

Guidance literature:

aluminium trichloride; In ⁽²⁾H₈-toluene; thermolysis at 180°C;

DOI:10.1021/ic0205482

upstream raw materials:

tri-tert-butoxy-chloro-silane

sodium t-butanolate

(tert-butoxy)B[tris(tert-butoxy)siloxy]2

water

Downstream raw materials:

[(tetraphenylporphyrin)Sn(IV)(OSi(O-tert-Bu)3)2]

1,2,3,4,5-pentamethylcyclopentadiene

[HC(C(Me)N(2,6-i-Pr-C6H3))2]Al(SH)(μ-O)Si(O-t-Bu)3

[HC(C(Me)N(2,6-i-Pr-C6H3))2]Al(OH)(μ-O)Si(O-t-Bu)3

Refernces

• 1、 Dombrowski, James P.,Johnson, Gregory R.,Bell, Alexis T.,Tilley, T. Don. "Ga[OSi(OtBu)3]3·THF, a thermolytic molecular precursor for high surface area gallium-containing silica materials of controlled dispersion and stoichiometry". . p. 11025 - 11034. Retrieved 2016/07/15.