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Tetramethylsilane
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Name

Tetramethylsilane

 EINECS 200-899-1
CAS No. 75-76-3 Density 0.677 g/cm3
PSA 0.00000 LogP 1.95440
Solubility Soluble in methanol, diethyl ether.Insoluble in cold water. Melting Point -27 °C
Formula C4H12Si Boiling Point 26.8 °C at 760 mmHg
Molecular Weight 88.2248 Flash Point -27℃
Transport Information UN 2749 Appearance Colorless clear liquid
Safety 16-33-9 Risk Codes 12
Molecular Structure Molecular Structure of 75-76-3 (Tetramethylsilane) Hazard Symbols HighlyF+
Synonyms

NSC 5210;T2050;TMS (silane derivative);Tetramethylsilane;

Article Data 150

Tetramethylsilane Synthetic route

72708-53-3

tris(trimethylsilylmethyl)gallium

593-81-7

trimethylamine hydrochloride

A

75-76-3

tetramethylsilane

B

72709-13-8

Ga(3+)*2CH2Si(CH3)3(1-)*Cl(1-)*N(CH3)3=Ga(CH2Si(CH3)3)2Cl*N(CH3)3

Conditions
ConditionsYield
In benzene under N2 or Ar mixt. in stoich. quantity stirred at room temp. for 2 h; volatile components removed by vac. distn., crude product sublimed at 32°C; elem. anal.;A 100%
B 98.5%
72708-53-3

tris(trimethylsilylmethyl)gallium

A

75-76-3

tetramethylsilane

B

Ga2(6+)*2CH2Si(CH3)3(1-)*4Cl(1-)=[GaCl2(CH2Si(CH3)3)]2

Conditions
ConditionsYield
With HCl under inert gas at 25°C for 12 h with 1:2 GaR3:HCl; vac. sublimation at 50°C; elem. anal.;A 99.6%
B 91%
72708-53-3

tris(trimethylsilylmethyl)gallium

A

75-76-3

tetramethylsilane

B

Ga2(6+)*2CH2Si(CH3)3(1-)*4Br(1-)=[GaBr2(CH2Si(CH3)3)]2

Conditions
ConditionsYield
With HBr under inert gas at 25°C for 12 h with 1:2 GaR3:HBr; extn. with benzene;A 99.5%
B 94.2%
72708-53-3

tris(trimethylsilylmethyl)gallium

A

75-76-3

tetramethylsilane

B

72708-90-8

[Ga(CH2Si(CH3)3)2Br]2

Conditions
ConditionsYield
With HBr under inert gas at 25°C for 12 h with 1:1 GaR3:HBr; recrystn. from benzene;A 99.2%
B 94%
72708-53-3

tris(trimethylsilylmethyl)gallium

A

72708-38-4, 72708-39-5

((trimethylsilyl)methyl)gallium(III) chloride

B

75-76-3

tetramethylsilane

C

Ga2(6+)*2CH2Si(CH3)3(1-)*4Cl(1-)=[GaCl2(CH2Si(CH3)3)]2

Conditions
ConditionsYield
With HCl In benzene HCl added in three equimolar portions by vac. distn. at -196°C, after each addn. mixt. warmed to room temp. and stirred for 1 h; volatile products fractionally distd., nonvolatile products extd. with n-pentane, insol. component collected, identified as Ga(CH2SiMe3)2Cl (elem. anal.), sol. fraction mixt. of Ga(CH2SiMe3)Cl2 and Ga(CH2SiMe3)3;A 50.5%
B 99.2%
C n/a
829-85-6

diphenylphosphane

693-13-0

diisopropyl-carbodiimide

A

790655-23-1, 642494-33-5

N,N′-diisopropyl-1,1-diphenylphosphanecarboximidamide

B

75-76-3

tetramethylsilane

Conditions
ConditionsYield
With C35H66Si3Y(1-)*C14H30LiO4(1+) In tetrahydrofuran at 80℃; for 1h; Mechanism; Reagent/catalyst; Solvent; Temperature; Schlenk technique; Inert atmosphere;A 97%
B n/a
69833-15-4

tris{(trimethylsilyl)methyl}indium

829-85-6

diphenylphosphane

A

75-76-3

tetramethylsilane

B

(((CH3)3SiCH2)2InP(C6H5)2)2

Conditions
ConditionsYield
In pentane byproducts: SiMe4; The reagents in benzene were combined in a reaction tube, evacuated and heated at 55°C for 7 d;; mixt. was cooled to -78°C, filtered, washed with benzene, recrystd. from pentane at -78°C; elem. anal.;;A 95%
B 93%
In pentane The reagents were combined in a reaction tube, evacuated and heated at 55°C for 3 d;; mixt. was cooled to -78°C, filtered, washed with pentane at -20°C; elem. anal.;;A n/a
B 94%
107-46-0

Hexamethyldisiloxane

75-76-3

tetramethylsilane

Conditions
ConditionsYield
With iodine; (3S,3aS,4S,4aS,6S,8aR,8bR,11S)-6,11-dihydroxy-3-methyl-12-methylene-2-oxo-4a,6-ethano-3,8b-prop-1-enoperhydroindeno[1,2-b]furan-4-carboxylic acid Heating;92%
With iodine; (3S,3aS,4S,4aS,6S,8aR,8bR,11S)-6,11-dihydroxy-3-methyl-12-methylene-2-oxo-4a,6-ethano-3,8b-prop-1-enoperhydroindeno[1,2-b]furan-4-carboxylic acid Mechanism; Heating; other permethyloligosiloxanes;92%
87640-52-6

(η5-C5Me5)(PMe3)2Ru(CH2SiMe3)

776-76-1

methyldiphenylsilane

A

75-76-3

tetramethylsilane

B

(η5-C5Me5)(PMe3)2ruthenium(Si(phenyl)2Me)

Conditions
ConditionsYield
In toluene In inert atmosphere, heating of Ru-complex with HSiEt3 (90°C, 9 h).; Evapn. in vac., recrystn. (toluene), elem. anal.;A n/a
B 92%
87640-52-6

(η5-C5Me5)(PMe3)2Ru(CH2SiMe3)

998-30-1

Triethoxysilane

A

75-76-3

tetramethylsilane

B

(η5-C5Me5)(PMe3)ruthenium{Si(OEt)3}2H

C

594-09-2

trimethylphosphane

Conditions
ConditionsYield
In inert atmosphere, heating of Ru-complex with HSi(OEt)3 (80°C, 12 h, closed vessel), briefly pumping to remove PMe3, continued heating (80°C, 6 h).; Evapn. in vac. gives a waxy solid, recrystn. (acetone), elem. anal.;A n/a
B 92%
C n/a

Tetramethylsilane Specification

The Tetramethylsilane, with the CAS registry number 75-76-3, is also known as Silane, tetramethyl-. It belongs to the product categories of Organics; Analytical Chemistry; NMR Spectrometry; Si (Classes of Silicon Compounds); Si-(C)4 Compounds; Standards for NMR; Alkyl Silanes; Organometallic Reagents; Organosilicon; Others Vapor Deposition Precursors; Precursors by Metal; NMR Reference Standards Alphabetic; NMR Stable Isotopes; NMR Organometallic Reagents; Analytical Standards; Others Alphabetic; Spectroscopy; TA - TE. Its EINECS registry number is 200-899-1. This chemical's molecular formula is C4H12Si and molecular weight is 88.22. Its IUPAC name is called tetramethylsilane. What's more, the product should be sealed and stored in cool, dry and well-ventilated place. TMS is a building block in organometallic chemistry but also finds use in diverse niche applications.

Physical properties of Tetramethylsilane: (1)ACD/LogP: 2.84; (2)ACD/LogD (pH 5.5): 2.84; (3)ACD/LogD (pH 7.4): 2.84; (4)ACD/BCF (pH 5.5): 84.26; (5)ACD/BCF (pH 7.4): 84.26; (6)ACD/KOC (pH 5.5): 831.72; (7)ACD/KOC (pH 7.4): 831.72; (8)Index of Refraction: 1.367; (9)Molar Refractivity: 29.29 cm3; (10)Molar Volume: 130.2 cm3; (11)Surface Tension: 13.6 dyne/cm; (12)Density: 0.677 g/cm3; (13)Enthalpy of Vaporization: 26.15 kJ/mol; (14)Boiling Point: 26.8 °C at 760 mmHg; (15)Vapour Pressure: 713 mmHg at 25°C.

Preparation of Tetramethylsilane: this chemical is a by-product of the production of methyl chlorosilanes, SiClx(CH3)4-x, via the direct process of reacting methyl chloride with silicon. The more useful products of this reaction are those for x = 1, 2, and 3.

Uses of Tetramethylsilane: it undergoes deprotonation upon treatment with butyllithium to give (H3C)3SiCH2Li. The latter, trimethylsilylmethyl lithium, is a relatively common alkylating agent. Tetramethylsilane is the accepted internal standard for calibrating chemical shift for 1H, 13C and 29Si NMR spectroscopy in organic solvents (where TMS is soluble). In water, where it is not soluble,sodium salts of DSS, 2,2-dimethyl-2-silapentane-5-sulfonate, is used instead. Because of its high volatility, TMS can easily be evaporated, which is convenient for recovery of samples analyzed by NMR spectroscopy.

When you are using this chemical, please be cautious about it as the following:
This chemical may cause damage to health. extremely flammable. It is harmful by inhalation and if swallowed. In addition, it is irritating to skin. You should keep it away from sources of ignition - No smoking. Whenever you will contact it, please wear suitable protective clothing. In case of accident or if you feel unwell seek medical advice immediately (show the label where possible).

You can still convert the following datas into molecular structure:
(1)Canonical SMILES: C[Si](C)(C)C
(2)InChI: InChI=1S/C4H12Si/c1-5(2,3)4/h1-4H3
(3)InChIKey: CZDYPVPMEAXLPK-UHFFFAOYSA-N

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