Detail of > 10028-18-9
- CAS Number:
- 10028-18-9
- Name:
Nickel fluoride
- Formula:
- F2Ni
- Molecular Structure:

- Synonyms:
- Nickeldifluoride;Nickel(2+) fluoride;Nickel(II) fluoride;Nickelous fluoride;
- Molecular Weight:
- 96.69
- EINECS:
- 233-071-3
- Density:
- 4.72 g/mL at 25 °C(lit.)
- Boiling Point:
- 19.5 °C at 760 mmHg
- Solubility:
- Slightly soluble in water, soluble in acid, alkali, ammonia and ethyl ether, in soluble in alcohol
- Appearance:
- Green crystalline powder
- Hazard Symbols:
T,
Xn,
Xi- Risk Codes:
- 45-36/37/38-42/43-40
- Safety:
- 53-26-36/37/39-45Details
- Transport Information:
- UN 3288
- Deleted CAS:
- 11113-73-8
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- 10028-18-9Nickel fluoride (NiF2)
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Reference
- Corrosion prevention of metal film
- Corrosion prevention of metal film. (Fujitsu Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 59013065 A2 23 Jan 1984 Showa, 3 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: C23C011-08. APPLICATION: JP 82-121655 13 Jul 1982. DOCUMENT TYPE: Patent CA Section: 56 (Nonferrous Metals and Alloys) Section cross-reference(s): 77 The film contg. Ni or Ni-Fe as a main constituent is coated with NiF2 by being exposed to a plasma contg. neutral F radicals. Thus, in manufg. a magnetic-memory plate a Permalloy film on an elec. 11068-82-9 and 10028-18-9 which are cas registry numbers of substances are two of reagents here. insulating layer was contacted with a CF4 plasma (0.1 torr, 300-400 W) for 1-5 min to form the NiF2 film to prevent corrosion. .
- Analysis of iron(III) fluoride and nickel(II) fluoride thin films by using RBS, (a,X) reactions, and SIMS measurements
- Analysis of iron(III) fluoride and nickel(II) fluoride thin films by using RBS, (a,X) reactions, and SIMS measurements. Gevers, G.; Barriere, A. S.; Grannec, J.; Lozano, L.; Blanchard, B. (Groupe Rech. Phys. Microelectron., CNRS, Talence 33405, Fr.). Phys. Status Solidi A, 81(1), 105-22 (English) 1984. CODEN: PSSABA. ISSN: 0031-8965. DOCUMENT TYPE: Journal CA Section: 75 (Crystallography and Liquid Crystals) The compn. 7783-50-8 and 10028-18-9 which are cas registry numbers are also used here. of FeF3 and NiF2 thin films prepd. by sublimation under vacuum, was investigated from several complementary anal. techniques (Rutherford backscattering spectroscopy (RBS) a, X reactions, and SIMS measurements). It greatly depends on fabrication parameters and further treatments. For a residual pressure in the prepn. enclosure <10-7 torr and a temp., Ts, of the substrate during the condensation of the vapor >400 K for FeF3 and <550 K for NiF2, the bulk compn. of the layers is quasi-stoichiometric. A lack of F was obsd. near the 2 faces of the films. It is correlated with the presence of O which probably corresponds to water adsorption, after an air exposure of the samples, followed by hydrolysis of the compds. This effect is considerably reduced by the presence of Au electrodes which protect the insulating layers, and under the conditions previously mentioned any diffusion can be noted. However, in all cases some traces of impurities are pointed out, mainly: Na, K, Ca, Cl which are probably present in the initial powder. On the other hand, FeF3 diffuses throughout a Au electrode for Ts <400 K, while for NiF2, the content of F decreases when Ts >550 K or when the films are annealed. .
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