Detail of "102-60-3"

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CAS Number:
102-60-3
Name:
2-Propanol,1,1',1'',1'''-(1,2-ethanediyldinitrilo)tetrakis-
Superlist Name:
N,N,N',N'-Tetrakis(2-hydroxypropyl)ethylenediamine
Molecular Structure:
Formula:
C₁₄H₃₂N₂O₄
Molecular Weight:
292.48
Deleted CAS:
70992-50-6|61702-85-0|139352-19-5|118549-63-6
Synonyms:
2-Propanol,1,1',1'',1'''-(ethylenedinitrilo)tetra- (6CI,7CI,8CI);1,1',1'',1'''-(1,2-Ethanediyldinitrilo)tetrakis[2-propanol];1,1',1'',1'''-(Ethylenedinitrilo)tetra(2-propanol);1,1',1'',1'''-(Ethylenedinitrilo)tetrakis(2-propanol);Adeka Quadrol;ENTPROL;EPD 300;Edetol;Laprol 294;N,N,N',N'-Tetra(2-hydroxypropyl)ethylenediamine;N,N,N',N'-Tetrakis(2-hydroxypropyl)ethylenediamine;N,N,N',N'-Tetrakis(b-hydroxypropyl)ethylenediamine;NP 300;NSC 369219;Neutrol;Neutrol TE;Newpol NP 300;Quadrol;Quadrol L;THPE;Tetrakis(2-hydroxypropyl)ethylenediamine;
EINECS:
203-041-4
Density:
1.1 g/cm³
Melting Point:
32 °C
Boiling Point:
369.1 °C at 760 mmHg
Flash Point:
145.7 °C
Solubility:
miscible with water
Appearance:
clear colorless to pale yellow viscous liquid
Hazard Symbols:
Xi
Risk Codes:
43
Safety:
36/37-37-24 Details

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Copper electroless coating solutions: Copper electroless coating solutions. (Toshiba Corp., Japan). Jpn. Kokai Tokkyo Koho JP 59123760 A2 17 Jul 1984 Showa, 5 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: C23C003-02. APPLICATION: JP 82-231139 29 Dec 1982. DOCUMENT TYPE: Patent CA Section: 56 (Nonferrous Metals and Alloys) Section cross-reference(s): 76 The solns. contain Cu salt, reducing agent, pH adjusting agent, N,N,N',N'-tetrakis(2-hydroxypropyl)ethylenediamine and S-contg. compd. 0.01-10 mg/L. The amine/Cu salt mol ratio is 1-10. The solns. optionally contain compd(s). selected from 1,10-phenanthroline or its deriv., 2,2'-dipyridyl, 2,2'-biquinoline 2-200, and water-sol. cyanides 2-3000 mg/L. The solns. have excellent stability, deposit Cu at a high rate, and are useful for manufg. printed circuit boards. Thus, Cu foil was immersed in a Cu coating soln. contg. CuSO4 0.04, N,N,N',N'-tetrakis(2-hydroxypropyl)ethylenediamine [102-60-3] 0.06, paraformaldehyde, NaOH, and Na sulfide. The deposition rate was high. The solns. was stable.

Stabilizers for fluorotrichloromethane stored in polyols: Stabilizers for fluorotrichloromethane stored in polyols. Akano, Akemi; Honda, Takayuki (Mitsui Fluorochemicals Co., Ltd., Japan). Japan. Kokai JP 53057298 24 May 1978 Showa, 5 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: C08G018-14. APPLICATION: JP 76-132575 4 Nov 1976. DOCUMENT TYPE: Patent CA Section: 36 (Plastics Manufacture and Processing) Mixts. of polyols and Cl3CF [75-69-4] for urethane polymer manuf. are stored stably in the presence of styrene derivs. (I, R1-3 = H or C1-3 alkyl) and benzotriazole derivs. (II; R4 = H, OH, halogen, or C1-3 alkyl; R5 = H or OH; R6, R7 = H or C1-5 alkyl). Thus, a mixt. of Cl3CF 46, N,N,N',N'-tetrakis(2-hydroxypropyl)ethylenediamine [102-60-3] 100, a-methylstyrene (III) [98-83-9] 0.23, and 2-(3-tert-butyl-2-hydroxy-5-methylphenyl)-5-chloro-2H-benzotriazole (IV) [3896-11-5] 0.0046 part had acid no. (g of KOH to neutralize 100 g of the mixt.) 0 and 0.28 before and after 16 days of storage at 50°, resp., and viscosity 320 and 800 cP, resp., compared with 0, 3.93, 320, and 3500, resp., for a similar mixt. without III and IV.