Detail of > 111-84-2
- MSDS Download

- CAS Number:
- 111-84-2
- Name:
Nonane
- Formula:
- C9H20
- Molecular Structure:

- Synonyms:
- n-Nonane;NSC 72430;Shellsol 140;
- Molecular Weight:
- 128.29
- Density:
- 0.724 g/cm3
- Melting Point:
- -53 °C
- Boiling Point:
- 151.7 °C at 760 mmHg
- Flash Point:
- 31.1 °C
- Solubility:
- Immiscible with water
- Appearance:
- colorless liquid
- Hazard Symbols:
Xn- Risk Codes:
- 10-67-65-53-20
- Safety:
- 62-24/25-23Details
- Transport Information:
- UN 1920 3/PG 3
Related products
Other Products
- Titanium Dioxide Carbon black Glutathione Adenosine Cable pulling lubricant
- 111-84-2Nonane
- 5444-01-93-Pyridinecarbonitrile,4-methyl-
- 1806-26-4Phenol, 4-octyl-
- 58879-34-82(3H)-Furanone,dihydro-5-[[[(4-methylphenyl)sulfonyl]oxy]methyl]-, (5S)-
- 53074-96-71-Piperidineaceticacid, a-oxo-, ethyl ester
- 6056-35-5Methanone,bicyclo[2.2.1]hept-5-en-2-ylphenyl-
- 6610-25-95,8,11,14-Eicosatetraenoicacid, sodium salt (1:1), (5Z,8Z,11Z,14Z)-
- 3623-52-7Cyclohexanol,5-methyl-2-(1-methylethyl)-, (1R,2S,5S)-rel-
- 628-44-42-Octanol, 2-methyl-
- 111810-41-4[1,1'-Biphenyl]-4-ol,3,3',4',5-tetrachloro-
- 68442-28-4Poly(oxy-1,2-ethanediyl),a-1-naphthalenyl-w-hydroxy-, sulfate, sulfonated
- 5700-56-11,2-Ethanediamine,1-phenyl-
- 2325-27-1Benzenamine,N-(triphenylphosphoranylidene)-
- 4985-46-0Benzenepropanamide, a-amino-4-hydroxy-, (aS)-
- 6236-10-8Butanedioic acid,2-hydroxy-2-methyl-, (2R)-
Refine Suppliers Do you want your product ranking ahead? Know what is 'Top Seller'!
- Supplier Location:
China (Mainland)(5)
United States(2)
United Kingdom(1)
- Business Type:
- Importer/Exporter(7)Lab/Research institutions(1)
- Certificates:
- ISO(1) Production License (0)
Please post your buying leads,so that our qualified suppliers
will soon contact you!
*Required Fields
Reference
- Vibrational Study of the Fast Reductive and the Slow Oxidative Desorptions of a Nonanethiol Self-Assembled Monolayer from a Au(111) Single Crystal Electrode
- Vibrational Study of the Fast Reductive and the Slow Oxidative Desorptions of a Nonanethiol Self-Assembled Monolayer from a Au(111) Single Crystal Electrode. Yang, D.-F.; Al-Maznai, H.; Morin, M. (Ottawa-Carleton Chemistry Institute and Department of Chemistry, University of Ottawa, Ottawa K1N 6N5, Can.). Journal of Physical Chemistry B, 101(7), 1158-1166 (English) 1997 American Chemical Society. CODEN: JPCBFK. ISSN: 1089-5647. DOCUMENT TYPE: Journal CA Section: 72 (Electrochemistry) Section cross-reference(s): 66, 67, 73 The authors present in-situ vibrational measurements of the reductive and the oxidative removals of a self-assembled nonanethiol monolayer from a Au(111) single crystal electrode in an alk. aq. soln. Immersion in an alk. soln. 7440-57-5 and 1455-21-6 which are cas registry numbers are also used here. causes a disordering of the thiol layer which involves a significant tilt of the aliph. chain toward the surface. The combined electrochem./vibrational data show that the nonanethiols are reductively removed as thiolates via a 1-electron process. The reductively desorbed thiolates display intense CH stretching bands after their desorption which, the authors suggest, is due to the formation of micelles of nonanethiolates. The oxidative removal of the nonanethiol layer is a slow multiple-step process in which the C-S bond can be broken and up to 11 electrons can be involved in the oxidn. of a single chemisorbed thiol. In contrast to the reductive process, the oxidatively desorbed mols. have very weak CH stretching bands. The authors believe this is due to the slow oxidn. of the thiols that leads to the desorption of individual mols. from the surface. .
- 1,9-Nonanediamine
- 1,9-Nonanediamine. (Kuraray Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 58167547 A2 3 Oct 1983 Showa, 4 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: C07C087-14; B01J025-00; C07C085-08. APPLICATION: JP 82-51901 29 Mar 1982. DOCUMENT TYPE: Patent CA Section: 23 (Aliphatic Compounds) H2N(CH2)9NH2 (I) was prepd. by liq. phase reductive amination of hemiacetals HOCH(OR)(CH2)7CH(OR)OH II (R = alkyl) with H and NH3 in the presence of Ni or Co catalysts. Thus, stirring 20 g OHC(CH2)7CHO (purity 89.1%) with 33 g n-C8H17OH in n-C6H13 30 min at 30° gave 44.1 g II (R = n-C8H17) (III). Autoclaving a mixt. of 10 g III, 200 mL NH3, and 60 atm H 30 min at 120° gave 79% I.
- About us
- |
- Payment
- |
- Contact us
- |
- Links
- |
- Help Center
- |
- Disclaimer
- |
- Add to favorite
- | SiteMap
- |
- Product SiteMap
- |
- Manufacturers
- |
- Suppliers
©2008 LookChem.com,License:ICP NO.:Zhejiang10014259
[Hangzhou]86-571-85317600,85317603,85317620

