CAS No.121-98-2,Benzoic acid,4-methoxy-, methyl ester Suppliers

Detail of "121-98-2"

CAS Number:

121-98-2

Name:

Benzoic acid,4-methoxy-, methyl ester

Superlist Name:

Methyl anisate

Molecular Structure:

Formula:

C₉H₁₀O₃

Molecular Weight:

166.17

Synonyms:

p-Anisicacid, methyl ester (6CI,7CI,8CI);4-(Methoxycarbonyl)anisole;4-Methoxybenzoicacid methyl ester;Methyl 4-methoxybenzoate;Methyl p-anisate;Methylp-methoxybenzoate;NSC 7324;p-Methoxybenzoic acid methyl ester;

EINECS:

204-513-2

Density:

1.098 g/cm³

Melting Point:

48-52 °C(lit.)

Boiling Point:

255.999 °C at 760 mmHg

Flash Point:

98.062 °C

Appearance:

white crystalline mass

Hazard Symbols:

Risk Codes:

36/37/38

Safety:

22-24/25 Details

Reference

Motor fuel composition containing an ashless antiknock agent: Motor fuel composition containing an ashless antiknock agent. Burns, Lyle D.; Parlman, Robert M. (Phillips Petroleum Co. , USA). U.S. US 4444567 A 24 Apr 1984, 4 pp. Cont.-in-part of U.S. Ser. No. 394,214, abandoned. (English). (United States of America). CODEN: USXXAM. CLASS: IC: C10L001-18. NCL: 044078000. APPLICATION: US 83-480962 31 Mar 1983. PRIORITY: US 82-394214 1 Jul 1982. DOCUMENT TYPE: Patent CA Section: 51 (Fossil Fuels, Derivatives, and Related Products) p-Anisaldehyde (I) [123-11-5], Me anisate [121-98-2], Et anisate [94-30-4], and Et 4-ethoxybenzoate [23676-09-7] are antiknock agents for unleaded gasoline at treating levels 3.8-11.3 wt.% (for I) and 2.5-7.5 vol.% (for the esters).

Dry process resist pattern formation: Dry process resist pattern formation.Some chemicals with cas registry numbers like 121-98-2 and 88177-22-4 are also used. (Sugita, Kazuyuki; Ueno, Nokuo, Japan). Jpn. Kokai Tokkyo Koho JP 57162330 A2 6 Oct 1982 Showa, 8 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: H01L021-30. APPLICATION: JP 81-46318 31 Mar 1981. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Section cross-reference(s): 76 Photodecomposable or photodissocn. type polymer coatings are imagewise exposed to deep UV light (￡270 nm) at an exposure rate of 3J/cm2 and if necessary heated (during or after the exposure) at a temp. below the softening point of the polymer to form resist patterns. Thus, a Cu laminated substrate was coated with poly(Me methacrylate) (Mn 140,000), the polymer layer was then imagewise exposed to a D lamp (84 J/cm2), and the laminate was treated with a FeCl3 soln. to form Cu patterns on the substrate. .

Detail of "121-98-2"

Benzoic acid,4-methoxy-, methyl ester

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CAS No.121-98-2 Methyl anisate

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CAS No.121-98-2 Methyl anisate

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CAS No.121-98-2 Methyl anisate

CAS No.121-98-2 Methyl anisate

CAS No.121-98-2 Methyl anisate

CAS No.121-98-2 Methyl anisate

CAS No.121-98-2 Methyl anisate

Reference