Detail of "12645-45-3"

CAS Number:
12645-45-3
Name:
IRIDIUM CHLORIDE
Molecular Structure:
Formula:
IrCl₃
Molecular Weight:
298.576
EINECS:
235-742-6
Density:
g/cm³
Boiling Point:
°Cat760mmHg
Flash Point:
°C
Safety:
Moderately toxic by intravenous route. Experimental reproductive effects. Details

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Method and apparatus for deposition of metal films by plasma chemical vapor deposition: Method and apparatus for deposition of metal films by plasma chemical vapor deposition. Sakamoto, Hitoshi; Oba, Yoshiyuki; Kobayashi, Chikako (Mitsubishi Heavy Industries, Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 2005015832 A2 20 Jan 2005, 24 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: ICM: C23C016-452. ICS: C23C016-08; H01L021-285. APPLICATION: JP 2003-180613 25 Jun 2003. 7782-50-5 and 12645-45-3 which are cas registry numbers are also used here. DOCUMENT TYPE: Patent CA Section: 56 (Nonferrous Metals and Alloys) Section cross-reference(s): 75 Deposition of metal films is carried out by feeding halogen gas into a reaction chamber contg. a work substrate for formation of halogen plasma, from which metal halide precursor is formed by plasma etching of a metal target, its deposition onto the work, and its redn. The work temp. is controlled to be lower than the target during deposition and increased to a value below the target temp. and suitable for redn. of the precursor. Various specifications and modifications of the process and app. for carrying out the process are also claimed. Damaging of substrates during deposition is prevented. .