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Detail of "12737-30-3"

  • CAS Number:
  • 12737-30-3
  • Name:
  • Cobalt nickel oxide

  • Molecular Structure:
  • Formula:
  • CoNiO2
  • Molecular Weight:
  • 149.6254

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CAS No.12737-30-3 Cobalt nickel oxide

Supplier:Nanjing Chemlin Chemical Co., Ltd. [ China (Mainland)]

610Integral
610

Tel:+86-25-83697070

Address:Rm.902 Longyin Plaza, No. 217 Zhongshan Rd.(N) Nanjing 210009,China

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CAS No.12737-30-3 Cobalt nickel oxide

Supplier:LEANCARE Limited [ United Kingdom]

610Integral
610

Tel:+(44) 1492 539 645

Address:28 Wynnstay Road, Colwyn Bay. Conwy. LL29 8NB. United Kingdom

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Reference

Method for preparing composite metal oxide thin film with quasi-hydrotalcite precursor
All Rights Reserved. Method for preparing composite metal oxide thin film with quasi-hydrotalcite precursor. Duan, Xue; Yang, Lan; Tian, Yuanyuan; Zhang, Fazhi (Beijing University of Chemical Technology, Peop. Rep. China). Faming Zhuanli Shenqing Gongkai Shuomingshu CN 1908244 A 7 Feb 2007, 13pp. (Chinese). (People's Republic of China). CODEN: CNXXEV. APPLICATION: CN 2010-89768 14 Jul 2006. DOCUMENT TYPE: Patent CA Section: 72 (Electrochemistry) Section cross-reference(s): 49, 57 The title method comprises: (1) immersing Al sheet into acetone or ethanol, deoiling with ultrasonic wave, immersing into 1-5% NaOH soln. for 1-3min, washing with deionized water, electrolyzing with 0.1-2mol/L sulfuric acid for 0.Several substances like 12737-30-3 may be metioned in this study.5-2.5h and drying at 60-90°C for 6-15h to obtain AAO/Al matrix, (2) dissolving M12+ and M22+ sol. inorg. salts in deionized water to obtain 0.003-0.1mol/L soln. at a [M12++M22+]/[A3+] mol. ratio of 2-6 and a [M M12+]/[M22+] mol. ratio of 0.2-6, putting AAO/Al matrix in a reaction soln., reacting at 70-90°C for 6-80h, washing with deionized water for 1-5times, drying at 50-90°C for 6-12h and adjusting pH to 8.0-10.0, and (3) putting the obtained quasi-hydrotalcite thin film in a muffle, heating at a speed of 1-10°C/min, firing at 450-600°C for 4-8h, cooling naturally to room temp. and taking out. The structure of the thin film is M12+zM22+1-x-zAl3+xO1+x/2. The thin film has the advantages of uniform particle distribution, high compactness, nanoscale thickness and good adhesiveness. .
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