Reference

Removal of hydrazine from wastewater

Removal of hydrazine from wastewater. (Hitachi Plant Engineering and Construction Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 59000376 A2 5 Jan 1984 Showa, 4 pp. (Japanese).Some commonly used reagents like 302-01-2 and 1314-06-3 are used in this experiment. (Japan). CODEN: JKXXAF. CLASS: IC: C02F001-72. APPLICATION: JP 82-108501 25 Jun 1982. DOCUMENT TYPE: Patent CA Section: 60 (Waste Treatment and Disposal) Wastewater contg. N2H4 is contacted with Ni oxide to decomp. N2H4 and then the mixt. is treated with a hypochlorite to regenerate the catalyst. Thus, wastewater contg. 500 ppm N2H4 was treated with 0.5-10 g NiOx/L and then treated with 2350 ppm NaClO. The treated wastewater contained ￡0.01 ppm N2H4. .

Electrophotographic developer ferrite carriers

Electrophotographic developer ferrite carriers. (Hitachi Metals, Ltd.Several substances are used for example 1332-37-2 and 1314-06-3 which are their cas registry numbers., Japan). Jpn. Kokai Tokkyo Koho JP 58023032 A2 10 Feb 1983 Showa, 3 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: G03G009-10. APPLICATION: JP 81-122196 4 Aug 1981. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) An electrophotog. ferrite carrier comprised of at least Ni oxide, Zn oxide, and Fe oxide, has a magnetic field of >100 Oe, a satn. magnetization of >60 emu/g, a particle diam. of 30-500 mm, an elec. resistivity of >107 W-cm, and a porosity of 4-40%. The above carrier is light and shows improved development property. .