Detail of "131880-16-5"

Reference

Photoacid generators

Photoacid generators. Houlihan, Francis M.Several substances are used for example 131880-16-5 and 578741-92-1 which are their cas registry numbers.; Toukhy, Medhat A.; Mullen, Salem K. (USA ). U.S. Pat. Appl. Publ. US 2004265733 A1 30 Dec 2004,8 pp. (English). (United States of America). CODEN: USXXCO. CLASS: ICM: G03F007-004. NCL: 430270100; 430322000; 430330000. APPLICATION: US 2003-609735 30 Jun 2003. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) A compn. useful for forming a photoresist layer at i-line (365 nm) comprises: (a) a film forming resin; (b) a compd. represented by the following formula I (R1 = C1-20-alkyl, C6-20-aryl, C6-20-aralkyl, which cab be unsubstituted or substituted by one or more groups selected from halogen, C1-20-alkyl, C18-perfluoroalkyl, C1-20-alkoxy, cyano, hydroxyl, or nitro; R2, R3 = H, C1-8-alkyl, C1-8-perfluoroalkyl, C1-8-alkoxy, nitro, halogen, carboxyl, hydroxyl, and sulfate; m, n = 0, pos. integer; X- = non-nucleophilic anion of an acid); (c) optionally, additives to adjust the optical, mech. and film forming properties; (d) optionally, a base or radiation sensitive base; and (e) a solvent. Applicants have now found that certain perfluoroalkyl onium salts useable at lower wavelengths (e.g., 193 nm and 157 nm), can now also be used at longer wavelengths, for example i-line (365 nm). Such a finding is unexpected since most photoresist compns. do not use a chem. amplified system at these wavelengths. .