Detail of "13530-68-2"

Reference

A new etching technique for enhancement of morphological textures of poly(p-phenylene sulfide)

A new etching technique for enhancement of morphological textures of poly(p-phenylene sulfide). Lopez, Leonardo C.; Wilkes, Garth L. (Dep. Chem. Eng., Virginia Polytech. Inst. and State Univ., Blacksburg, VA 24061, USA). J. Polym. Sci., Part C: Polym. Lett., 24(11), 573-9 (English) 1986. CODEN: JSCLE2. DOCUMENT TYPE: Journal CA Section: 36 (Physical Properties of Synthetic High Polymers) The spherulitic textures of semicryst. poly(p-phenylene sulfide) [25212-74-2] were more enhanced by an AlCl3 etching technique than by chromic acid [13530-68-2] etching.

Chromic acid etching of polypropylene filaments

Chromic acid etching of polypropylene filaments. Garton, A.; Carlsson, D. J.; Wiles, D. M. (Div. Chem., Natl. Res. Counc. Canada, Ottawa, Ont., Can.). Text. Res. J., 48(2), 115-22 (English) 1978. CODEN: TRJOA9. ISSN: 0040-5175. DOCUMENT TYPE: Journal CA Section: 39 (Textiles) Chromic acid [13530-68-2] etching effectively removes successive layers of polypropylene filaments and renders the interior morphol. accessible to electron microscopic examn. This technique was used on a range of as-spun, hot-drawn, and deformed filaments. The factor limiting the efficiency of the etch process appears to be the ease of penetration of the etchant into the filament. When the structure was opened up by fibrillation or voiding, the rate of etching increased dramatically. Little difference was obsd. in etch rates for unvoided samples, between unaligned and highly oriented structures.