Detail of "15632-39-0"

Reference

Method and apparatus for continuous chemical vapor deposition

All Rights Reserved. Method and apparatus for continuous chemical vapor deposition. Meng, Guangyao; Liu, Mingfei (University of Science and Technology of China, Peop. Rep. China). Faming Zhuanli Shenqing Gongkai Shuomingshu CN 1865497 A 22 Nov 2006, 9pp. (Chinese).Some commonly used reagents like 15632-39-0 and 887909-50-4 are used in this experiment. (People's Republic of China). CODEN: CNXXEV. APPLICATION: CN 2010-85969 10 Jun 2006. DOCUMENT TYPE: Patent CA Section: 75 (Crystallography and Liquid Crystals) The title app. contains multiple CVD chambers with independently controlled system parameters connected together. The title method comprises: (1) providing source substances including gaseous compds., vaporizable liq. compds., or solid compds. for the CVD chamber, (2) slowly moving a substrate along the flow direction of the source gas, passing through sequentially multiple CVD chambers for heat treatment, growing a thin layer of solid deposits on the heated and pretreated surface of the substrate, and (3) discharging residual gas. The multiple thin layers are continuously formed by heat treatment or growing in each CVD chamber. In this method, the parameters for depositing each thin layer is independently controlled, which can largely shorten time for temp. elevation and lowering, and increase the service life of the app. during heat circulation, and the chambers for growing different layers are compared to avoid the infection of residual gas to the deposition of the next layer. The method has realized the continuous deposition of thin layers on a large area substrate, and largely improved the use rate of both the source substances and heat energy. The app. is energy-saving, material-saving, simple, and easily controlled. .

Two modifications of yttrium(III) dipivaloylmethanate

Two modifications of yttrium(III) dipivaloylmethanate. Baidina, I. A.; Gromilov, S. A.; Stabnikov, P. A. (Inst. Neorg. Khim., Novosibirsk, USSR). Sib. Khim. Zh., (1), 148 (Russian) 1992. CODEN: SKZHEC. ISSN: 0002-3426. DOCUMENT TYPE: Journal CA Section: 75 (Crystallography and Liquid Crystals) Section cross-reference(s): 78 The title compd. (m.p. 198°) is orthorhombic, space group Pbca, with a 18.877(7), b 18.998(6), and c 20.461(6) ?; dm = 1.13 and dc = 1.156 for Z = 8. The title compd. (m.p. 176°) is orthorhombic, space group Pmn21, with a 17.868(3), b 9.977(2), and c 10. 15632-39-0 is just another one chemical used in this study.633(2) ?; dm = 1.116 and dc = 1.119 for Z = 2. .