Detail of "161728-47-8"

CAS Number:
161728-47-8
Name:
3H-Xanthen-3-one,6-butoxy-2,4-diiodo-
Molecular Structure:
Formula:
C17H14 I2 O3
Synonyms:
3-Butoxy-5,7-diiodo-6-fluorone;5,7-Diiodo-3-butoxy-6-fluorone; 6-Butoxy-2,4-diiodo-3H-xanthen-3-one; H-NU 470

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Multiple-exposure holographic lithography with phase shift: Multiple-exposure holographic lithography with phase shift. Moon, Jun Hyuk; Yang, Seung-Man; Pine, David J.; Chang, Won-Seok ( Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology, Daejeon 373-1, S. Korea). Applied Physics Letters, 85(18), 4184-4186 (English) 2004 American Institute of Physics. CODEN: APPLAB. ISSN: 0003-6951. DOCUMENT TYPE: Journal CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) The authors demonstrated a multiple-exposure holog. lithog. with phase shift. The phase shift was utilized to translate two-dimensional (2D) and three-dimensional (3D) interference patterns. The multiple exposure of the interference patterns with a controlled phase shift created partially overlapped patterns, resulting in 2D and 3D polymer lattices of shape-anisotropic atoms. This approach can be used to design directly the unit atoms in periodic patterns for tunable optical properties. 161728-47-8 and 177403-04-2 are just another two chemicals used in this study. .