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Detail of "1681-60-3"

  • MSDS Download
  • CAS Number:
  • 1681-60-3
  • Name:
  • 2,7-Naphthalenedisulfonicacid, 3-[2-(4-aminophenyl)diazenyl]-4,5-dihydroxy-, sodium salt (1:2)

  • Molecular Structure:
  • Formula:
  • C16H13 N3 O8 S2 . 2 Na
  • Molecular Weight:
  • 483.3834
  • Synonyms:
  • 2,7-Naphthalenedisulfonicacid, 3-[(4-aminophenyl)azo]-4,5-dihydroxy-, disodium salt (9CI); C.I. AcidViolet 3 (7CI); C.I. Acid Violet 3, disodium salt (8CI); Acid Leather Violet4BS; Acid Violet; Acid Violet 3; Acid Violet 4BS; Acid Violet EB; Acilan Violet4BS; Amacid Victoria Violet 4BS; Azo Wool Violet 4B; Azoic Violet 4BS; C.I.16580; Calcocid Violet 4BS; Erio Violet B; Fabracid Violet S 4BS; HispacidViolet 4B; Kiton Violet 3B; Kiton Violet 4BS; Merantine Violet AV; NaphtocardVictoria Violet 4BS; Pontacyl Violet 4BSN; Tertracid Violet 4BS; Victoria Violet4BS; Victoria Violet 7BS; Wool Violet 4BS
  • Density:
  • g/cm3
  • Boiling Point:
  • °Cat760mmHg
  • Flash Point:
  • °C

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CAS No.1681-60-3 2,7-Naphthalenedisulfonicacid, 3-[2-(4-aminophenyl)diazenyl]-4,5-dihydroxy-, sodium salt (1:2)

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CAS No.1681-60-3 PONTACYL VIOLET 4BSN

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CAS No.1681-60-3 PONTACYL VIOLET 4BSN

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CAS No.1681-60-3 2,7-Naphthalenedisulfonicacid, 3-[2-(4-aminophenyl)diazenyl]-4,5-dihydroxy-, sodium salt (1:2)

Supplier:American Enterprises Pvt Ltd [ India]

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Reference

Photosensitive compositions
Photosensitive compositions. Sugasawa, Noboru; Hayashi, Nobuyuki (Hitachi Chemical Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 61200536 A2 5 Sep 1986 Showa, 5 pp. (Japan) CODEN: JKXXAF. CLASS: ICM: G03C001-68. ICS: C08F002-48; C08F299-06. APPLICATION: JP 85-41699 1 Mar 1985. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Photosensitive compns., useful for the fabrication of printed circuit boards, contain polymers [glass transition temp. (Tg) 40-130°] obtained by reaction of isocyanatoethyl methacrylate (I) and vinyl-type linear polymers (II) obtained by copolymg. 1 vinyl- and 1 OH-contg. compds. 5-85, 1 vinyl- and CO2H-contg. compds. 10-40, and 1 vinyl-contg. compds. £80%, where equiv. ratios of NCO of I and OH of II are 0.3-1.3, and sensitizers and/or their systems which form free radicals upon exposure to active light. Ethylene glycol monoethyl ether acetate (III) 411, methacrylic acid 66, styrene 15, Me methacrylate 45, Et acrylate 24, 2-hydroxyethyl methacrylate 150, and AIBN 4.5 parts were stirred at 95° for 5 h, mixed with a mixt. of 9 parts III and 1 part AIBN, stirred at 95° for 6 h, mixed with a mixt. of 2 parts III and 0.06 part hydroquinone, and stirred for 30 min to obtain a vinyl-type linear copolymer, which was kept at 65° and 175 parts isocyanatoethyl methacrylate was added dropwise over 1 h and stirred at 65° for 5 h to obtain a polymer (IV; Tg ~60°). IV 225, Kayacure DMBI (arom. tertiary amine) 4, 2,4-diethylthioxanthone 2.5, Acid Violet 0.3, III 25, MEK 12, and MeOH 11 g were stirred to obtain a compn., which was applied onto a Cu-plated laminate to form a ~10-m film. 1681-60-3 and 30674-80-7 which are cas registry numbers of substances are two of reagents here. The resulting photosensitive compn. was superposed with a neg. film, exposed in vacuo with 200 mJ/cm2, spray developed with 2% aq. Na2CO3, and etched with aq. FeCl3 (40° Baumé) to obtain a circuit board faithful to the neg. film, showing a resoln. 330 m. .
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