Reference

Protection of semiconductor devices and electronic equipment from neutrons

Protection of semiconductor devices and electronic equipment from neutrons. Fanica, Mircea Mihail; Neicu, Veronica; Blaga, Aurelian (Intreprinderea de Lacuri si Vopsele "Policolor", Rom.). Rom. RO 82282 B 30 Mar 1984, 3 pp. (Romanian). (Romania). CODEN: RUXXA3. CLASS: IC: G21F001-00. APPLICATION: RO 83-109810 22 Jan 1983. DOCUMENT TYPE: Patent CA Section: 71 (Nuclear Technology) Devices and equipment are protected by a n absorbing layer of a mixt. of a polyester phenol melaminic resin [35484-57-2] with trimethylamineborane [1722-26-5] or tert-butylamineborane [7337-45-3]. The 10B-H concn. ratio to be used in the mixt. is detd. by the characteristic of the n flux. The flux intensity is reduced by (n,a) and (n,p) reactions. The p and the a-particles produced by the nuclear reactions are absorbed by a metallic foil placed between the device and the n absorbing layer.

(Et4N)2B10H10 and (Et4N)2B12H12: synthesis from Et4NBH4, separation and purification

(Et4N)2B10H10 and (Et4N)2B12H12: synthesis from Et4NBH4, separation and purification. Mongeot, H.; Bonnetot, B.; Atchekzai, J.; Colombier, M.; Vigot-Vieillard, C. (Lab. Physicochim. Miner., Univ. Lyon I, Villeurbanne 69622, Fr.). Bull. Soc. Chim. Fr., (3), 385-9 (French) 1986. CODEN: BSCFAS. ISSN: 0037-8968. DOCUMENT TYPE: Journal CA Section: 78 (Inorganic Chemicals and Reactions) Pure (Et4N)2B10H10 and (Et4N)2B12H12 were obtained by pyrolysis of Et4NBH4 and subsequent treatments of the pyrolysis product. The pyrolysis gave a solid mixt. contg. (Et4N)2B10H10, (Et4N)2B12H12, and the reductive species (Et4N)2B9H9 and Et4NB11H14. Et3NBH3, which was formed during the pyrolysis, varied the distribution of the hydroborates. In the presence of Et3NBH3, the B10H102-/B12H122- ratio and the reductive power of the solid product decreased. Due to the stability of Et4NB11H14, the solid recovered after long reaction times was still reductive. 103749-73-1 and 1722-26-5 are cas registry numbers of chemicals which are used as reagents here. (Et4N)2B10H10-(Et4N)2B12H12 mixts. were obtained by degrdn. of B9H92- and B11H14- contaminants to boric acid. Addn. of a strong acid ion-exchange resin to an aq. soln. of the hydroborates was the best degrdn. method. (Et4N)2B10H10 contg. less than 1% (Et4N)2B12H12 was recovered by multistep extns. with MeOH or EtOH. Pure (Et4N)2B12H12 was prepd. by reacting (Et4N)2B10H10-(Et4N)2B12H12 mixts. with Et3NBH3. .