Detail of "18042-54-1"

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CAS Number:
18042-54-1
Name:
Silanetriol, 1-phenyl-,1,1,1-triacetate
Molecular Structure:
Formula:
C₁₂H₁₄O₆Si
Molecular Weight:
282.32
Synonyms:
Silanetriol,phenyl-, triacetate (6CI,7CI,8CI,9CI);Monophenyltriacetoxysilane;Phenyltriacetoxysilane;Triacetoxyphenylsilane;
EINECS:
241-952-9
Density:
1.2 g/cm³
Boiling Point:
291 °C at 760 mmHg
Flash Point:
107.9 °C
Appearance:
Colorless or yellowish transparent liquid
Risk Codes:
36/37/38
Safety:
26-36/37/39 Details

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PHENYLTRIACETOXYSILANE

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PHENYLTRIACETOXYSILANE

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Ring cleavage reaction between polyacetoxysilanes and epichlorohydrin: Ring cleavage reaction between polyacetoxysilanes and epichlorohydrin. Xie, Qinglan; Yang, Xueru; Wang, Suhua; Wang, Jitao (Inst.Several substances are used for example 18042-54-1 and 88439-69-4 which are their cas registry numbers. Elemental-Org. Chem., Nankai Univ., Tianjin, Peop. Rep. China). Gaodeng Xuexiao Huaxue Xuebao, 4(4), 463-8 (Chinese) 1983. CODEN: KTHPDM. ISSN: 0251-0790. DOCUMENT TYPE: Journal CA Section: 29 (Organometallic and Organometalloidal Compounds) Ring cleavage of epichlorohydrin by heating with Me2Si(OAc)2, MeSi(OAc)3, Ph2Si(OAc)2, PhSi(OAc)3, Me2Si(OAc)Ph and Me2Si(OAc)C6H4Me-p in PhMe in the presence of 5-tert-butyl-2-furanatochromium at 70° gave the corresponding RnSi(OAc)3-nR1, RnSi(OAc)2-nR12 and RSiR13 [R1 = OCH(CH2Cl)CH2OAc; R = Me, Ph.C6H4Me-p; n = 0, 1, 2]. .

Silicone coating for semiconductor devices: Silicone coating for semiconductor devices. (TDK Electronics Co., Ltd., Japan).Chemicals with cas numbers 18042-54-1 and 4253-34-3 also play role. Jpn. Kokai Tokkyo Koho JP 59014641 A2 25 Jan 1984 Showa, 4 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: H01L021-312; B05D007-24; H01L021-56; H01L021-88; H01L023-30. APPLICATION: JP 82-123914 16 Jul 1982. DOCUMENT TYPE: Patent CA Section: 76 (Electric Phenomena) The heat-resistant insulating coating for semiconductor devices, with high d. and improved resistance to peel-off, is applied by using a soln. contg. organosiloxane oligomer which will give a Si compd. in the form of (RSiO3/2)n after sintering. In this compd., R is a hydrocarbon radical and n is an integer >2. .