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Detail of "18666-68-7"

  • CAS Number:
  • 18666-68-7
  • Name:
  • Benzene,1,1',1''-(ethenylsilylidyne)tris-

  • Molecular Structure:
  • Formula:
  • C20H18Si
  • Molecular Weight:
  • 286.44
  • Synonyms:
  • Silane,ethenyltriphenyl- (9CI);Silane, triphenylvinyl- (6CI,7CI,8CI);Ethenyltriphenylsilane;NSC 139006;Triphenylsilylethylene;Triphenylvinylsilane;Vinyltriphenylsilane;
  • EINECS:
  • 242-487-4
  • Density:
  • 1.04 g/cm3
  • Melting Point:
  • 68-70 °C(lit.)
  • Boiling Point:
  • 365.9 °C at 760 mmHg
  • Flash Point:
  • 161.3 °C
  • Hazard Symbols:
  • IrritantXi
  • Risk Codes:
  • 36/37/38
  • Safety:
  • 26-36 Details

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CAS No.18666-68-7 Benzene,1,1',1''-(ethenylsilylidyne)tris-

Purity: >97%

Supplier:Silar Laboratories [ United States]

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Tel:+1 910-762-5800

Address:102 Orange Street

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CAS No.18666-68-7 Benzene,1,1',1''-(ethenylsilylidyne)tris-

Supplier:Zhengzhou Alfachem Co., Ltd. [ China (Mainland)]

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Tel:0371-55616343

Address:zhengzhou

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CAS No.18666-68-7 Benzene,1,1',1''-(ethenylsilylidyne)tris-

Supplier:Beijing zhongke expanding chemical technology Co., LTD. [ China (Mainland)]

600Integral
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Tel:010-51600645 58608265;57131961

Address:Beijing changping area connects center north pearl tower 2 buildings

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Reference

Characteristics of the molecular-weight distribution of copolymers of vinyltrimethyl(phenyl)silanes with butadiene
Characteristics of the molecular-weight distribution of copolymers of vinyltrimethyl(phenyl)silanes with butadiene. Piryatinskii, V. M.; Skaska, V. S.; Nametkin, N. S.; Durgar'yan, S. G. (Inst. Neftekhim. Sint. im. Topchieva, Moscow, USSR). Dokl. Akad. Nauk SSSR, 240(5), 1127-30 [Chem.] (Russian) 1978. CODEN: DANKAS. ISSN: 0002-3264. DOCUMENT TYPE: Journal CA Section: 35 (Synthetic High Polymers) Mol. wt. distribution (MWD) curves for Me3SiCH:CH2 (I) [754-05-2] and Ph3SiCH2:CH2 (II) [18666-68-7] copolymers with butadiene (III) [106-99-0] are studied with respect to the mechanism of their pptn. via Li-initiated copolymn. MWD curves for both I-III copolymer (IV) [32874-08-1] and II-III copolymer [67478-09-5] were unimodal and exhibited peak broadening with increasing silane monomer content. The peak broadening in the case of IV corresponded to a decreased overall rate of copolymn. and to occurrence of chain-terminating reactions typical of I homopolymn. With II, the copolymn. rates changed little with increasing II content, but the MWD peak broadening was accompanied by increased wt. av. mol. wt., indicating chain branching reactions.
Comparative sulfonation of various substituted silicon compounds
Comparative sulfonation of various substituted silicon compounds. Application to the synthesis of new sulfonic acids. Grignon-Dubois, M.; Pillot, J. P.; Dunogues, J.; Duffaut, N.; Calas, R.; Henner, B. (CNRS, Univ. Bordeaux I, Talence, Fr.). J. Organomet. Chem., 124(2), 135-42 (French) 1977. CODEN: JORCAI. DOCUMENT TYPE: Journal CA Section: 29 (Organometallic and Organometalloidal Compounds) Sulfonation by ClSO3SiMe3 of various substituted Si compds. is regiosp. or highly regioselective at the Si atom, the reaction order is: allyl > . 18666-68-7 and 62381-49-1 are also in the experiment.alpha.-naphthyl > phenyl > vinyl. Thus, sulfonation of EtPh2SiCH2CH:CH2 gave 85% EtPh2SiO3SCH2CH:CH2. Sulfonation of various mono- and disilylated derivs. gave trimethylsilylmono- and in some cases trimethylsilyldisulfonates, which by hydrolysis form new sulfonic acids. The orientation of the sulfonation is detd. by the position of the Si atom. Cyclohexyl hinders sulfonation (cyclo-C6H11Si is much less reactive than MeSi), whereas cyclopropyl, due to its .pi.-character, is much more reactive. .
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