Reference

Grafting of amino groups on polybutadiene by hydrosilylation

Grafting of amino groups on polybutadiene by hydrosilylation. Hazziza-Laskar, Judith; Helary, Gerard; Sauvet, Georges (Lab. Rech. Macromol., Univ. Paris-XIII, Villetaneuse 93430, Fr.). Makromol. Chem., Macromol. Symp., 47(Int. Symp. Mech. Kinet. Polym. React.: Their Use Polym. Synth.Several substances with their cas registry numbers 2155-94-4 and 16941-12-1 may be metioned in this study., 1990), 383-91 (English) 1991. CODEN: MCMSES. ISSN: 0258-0322. DOCUMENT TYPE: Journal CA Section: 35 (Chemistry of Synthetic High Polymers) Hydrosilylation catalyzed by hexachloroplatinic acid was used to introduce tertiary amino groups in an hydroxytelecelic polybutadiene. Kinetics and mechanisms were investigated. At low silane concn. the reaction is first-order in Pt, second-order in silane and zero-order in vinylic double bonds. The apparent rate const. is inversely proportional to the concn. of amino groups (inhibitory effect). At high silane concn., very sharp acceleration periods are obsd. and explained by a transformation of a weakly active Pt(II) catalyst into a more active Pt(0) compd. .

Organosilicon compound, its producing method, and toner and dry-type developer using the same

Organosilicon compound, its producing method, and toner and dry-type developer using the same. Shimoda, Masakatsu; Iimura, Haruo; Takahashi, Hiroyuki; Matsumoto, Fuyuhiko (Ricoh Company, Ltd., Japan). U.S. US 5595852 A 21 Jan 1997, 11 pp. (English). (United States of America). CODEN: USXXAM. CLASS: ICM: G03G009-097. 2155-94-4 which is the cas registry number is also used here. NCL: 430110000. APPLICATION: US 1995-534640 27 Sep 1995. PRIORITY: JP 1994-234571 29 Sep 1994; JP 1995-30018 26 Jan 1995; JP 1995-76641 31 Mar 1995; JP 1995-76826 31 Mar 1995; JP 1995-233135 11 Sep 1995; JP 1995-234526 12 Sep 1995; JP 1995-273603 27 Sep 1995. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) There are provided an organosilicon compd. of formula [R1R2R3Si(CH2)3NMe2R4]+X- (R1-3 = alkyl having 1 to 6 carbon atoms or Ph group which may have a substituent; R4 = alkyl, Ph, or benzyl with the proviso that the above groups may have substituents; X = halogen, benzenesulfonate, hydroxynaphthalenesulfonate, BPh4, BF4, ClO4, or SbCl5) and its producing method. In addn., an toner and a two-component dry developer for developing latent electrostatic images contg. the above organosilicon compd. are also provided. .