Detail of "2283-08-1"

Reference

Development enhancement of radiation-sensitive elements

Development enhancement of radiation-sensitive elements. Memetea, Livia T.; Jaramillo, Juana G.; Bradford, Nicholas; Goodin, Jonathan W.; Yang, Cheng; Levanon, Moshe (Can. ). U. 90-15-3 and 2283-08-1 are also occured in this study.S. Pat. Appl. Publ. US 2005003296 A1 6 Jan 2005,21 pp., Cont.-in-part of U.S. Ser. No. 647,910, abandoned. (English). (United States of America). CODEN: USXXCO. CLASS: ICM: G03C001-76. NCL: 430270100. APPLICATION: US 2004-800133 12 Mar 2004. PRIORITY: US 2002-PV364078 15 Mar 2002; US 2003-388488 17 Mar 2003; US 2003-647910 25 Aug 2003. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Section cross-reference(s): 38 A pos.-working radiation-sensitive compn. for use with a radiation source comprises one or more polivinyl acetal polymers capable of being dissolved in an alk. aq. soln. and a development-enhancing compd. The sensitivity of a radiation-sensitive coating based on the compn. of this invention is increased without compromising the handling characteristics. Radiation-sensitive elements based on the compn. of the invention have good development latitude. A pos.-working lithog. printing precursor is based on the radiation-sensitive compn. coated on a hydrophilic surface. The precursor is developable using an alk. aq. soln., and may be used with a radiation source in lithog. applications, such as conventional imaging systems, computer-to-plate systems or other direct imaging applications. The precursor is stable in its state before exposure and has an excellent handling property. .