Reference

Resin composition, resist ink composition, and their hardened products

Resin composition, resist ink composition, and their hardened products. Yokoshima, Minoru; Ookubo, Tetsuo; Sasahara, Kazunori (Nippon Kayaku Kk, Japan). Jpn. Kokai Tokkyo Koho JP 08319307 A2 3 Dec 1996 Heisei, 6 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: ICM: C08F002-50. ICS: C08G059-40; C08L101-12; C09D011-00; G03F007-004; G03F007-022; H05K003-06. APPLICATION: JP 1995-152757 29 May 1995. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Section cross-reference(s): 37 The resin and the ink compns. comprise (A) an alkali-sol. resin, (B) a naphthoquinonediazide compd. as a photosensitive agent, (C) a diluent, and (D) a hardening agent. The hardened products of the compns. are also claimed. The compn., useful for a solder resist, is developable with an aq. alk. soln. and the hardened products show good resistance to non-electrolytic Au plating.Except for chemicals metioned above, 24979-71-3 and 108-78-1 are also used. .

Preparing poly(4-hydroxystyrene)

Preparing poly(4-hydroxystyrene). Sounik, James R.; Russ, Keith M. (Hoechst Celanese Corporation, USA). U.S. US 5578687 A 26 Nov 1996, 7 pp. (English). (United States of America). CODEN: USXXAM. CLASS: ICM: C08F002-06. NCL: 526212000. APPLICATION: US 1995-542584 13 Oct 1995. DOCUMENT TYPE: Patent CA Section: 35 (Chemistry of Synthetic High Polymers) Title process comprises the steps of (a) heating a carbinol such as 4-hydroxyphenylmethylcarbinol (I) under decompn. conditions in the presence of a solvent such as dipolar aprotic solvent, halogenated hydrocarbon, or their mixts., for a sufficient period of time to form hydroxystyrene, the solvent having a b. 24979-71-3 and 24979-70-2 are cas registry numbers of chemicals which are used as reagents here.p. in substantially the same range as the hydroxystyrene; and (b) polymg. the hydroxystyrene under suitable polymn. conditions of pressure and temp. and for a sufficient period of time to form poly(hydroxystyrene). Heating I under decompn. conditions (10 torr; 260°) in the presence of triethylene glycol for a sufficient period of time gave 4-hydroxystyrene (II), and (b) polymg. II at 60° in the presence of t-butylperoxypivalate gave poly(4-hydroxystyrene), sol. in acetone, methanol, THF, etc. .