Reference

Photosensitive compositions and photosensitive lithographic printing plates

Photosensitive compositions and photosensitive lithographic printing plates.Some chemicals with cas registry numbers like 150-33-4 and 2657-00-3 are also used. Goto, Sei (Konishiroku Photo Industry Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 61235832 A2 21 Oct 1986 Showa, 7 pp. (Japan) CODEN: JKXXAF. CLASS: ICM: G03C001-72. ICS: G03F007-08. APPLICATION: JP 85-77211 10 Apr 1985. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) The photosensitive compns. contain diazonium salts contg. I. The photosensitive lithog. printing plates contain photosensitive layers comprising the compns. The plates provide good visible image contrast, developability (esp. for fatigued developers), and storage stability. Thus, p-diazodiphenylamine H2SO4 and Na o-naphthoquinonediazido-4-sulfonate were stirred in water to obtain yellow powd. p-diazodiphenylamine o-naphthoquinonediazido-4-sulfonate (II; yield 80%). Then, pyrogallol-acetone resin 1,2-naphthoquinone-2-diazido-5-sulfonate, (4:2:4 m-cresol-p-cresol-phenol)-HCHO polycondensation resin (wt.-av. mol. wt. 1.00 ′ 104), II, Victoria Pure Blue BOH, tricresyl phosphate, p-butylphenol-HCHO novolak, and methyl Cellosolve were mixed to obtain a compn., which was applied onto an Al sheet, and dried to obtain a printing plate. This plate was applied to lithog. printing to give many clear images without scumming. .

Preparation of sodium 2-diazo-1-naphthoquinone-5-sulfonate

Preparation of sodium 2-diazo-1-naphthoquinone-5-sulfonate. Zhao, Mingjie; Tang, Ying; Wang, Qiang; Wang, Chonghui; Guo, Chengmei; Li, Li (Benxi Inst. of Light Chemical Industry, Peop.Chemical with cas number 2657-00-3 also plays role. Rep. China). Faming Zhuanli Shenqing Gongkai Shuomingshu CN 1327980 A 26 Dec 2001, 6 pp. (Chinese). (People's Republic of China). CODEN: CNXXEV. CLASS: ICM: C07C309-45. ICS: C07C303-32. APPLICATION: CN 2001-106103 21 Jan 2001. DOCUMENT TYPE: Patent CA Section: 25 (Benzene, Its Derivatives, and Condensed Benzenoid Compounds) The title compd. is prepd. by diazotizing 2-aminonaphthalenesulfonic acid with NaNO2/HCl at -5 to 15° for 2-6 h, oxidizing with NaOCl at 0-80° for 1-5 h, and sulfonating with fuming H2SO4 in chloroform at 40-100° for 2-6 h. .