Detail of "2832-45-3"

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CAS Number:
2832-45-3
Name:
1-Hexanesulfonic acid,sodium salt (1:1)
Superlist Name:
Sodium 1-hexanesulfonate
Molecular Structure:
Formula:
C₆H₁₃NaO₃S
Molecular Weight:
188.22
Deleted CAS:
163883-55-4
Synonyms:
1-Hexanesulfonicacid, sodium salt (8CI,9CI);Hexylsulfonic acid sodium salt;Sodium 1-hexylsulfonate;Sodium hexanesulfonate;Sodiumhexyl sulfonate;Sodium n-hexylsulfonate;Sodium-1-hexane sulfonate;
EINECS:
220-601-3
Density:
1.017 g/cm³
Melting Point:
>300 °C(lit.)
Appearance:
White crystalline solid
Hazard Symbols:
Xi
Risk Codes:
36/37/38
Safety:
37/39-26-36/37/39-27 Details

Soluble fluorinated cycloalkane sulfonate surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions for integrated circuit manufacture: Soluble fluorinated cycloalkane sulfonate surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions for integrated circuit manufacture. Hopkins, Ronald J.Several substances are used for example 67584-42-3 and 2832-45-3 which are their cas registry numbers.; Thomas, Evan G.; Kieta, Harold J. (Allied Corp., USA). U.S. US 4620934 A 4 Nov 1986, 4 pp. (United States of America) CODEN: USXXAM. CLASS: ICM: C09K013-06. ICS: B44C001-22; C03C015-00; C03C025-06. NCL: 252079400. APPLICATION: US 85-733568 13 May 1985. PRIORITY: US 84-604112 26 Apr 1984. DOCUMENT TYPE: Patent CA Section: 76 (Electric Phenomena) The title etching solns. for SiO2 have desirable etching rates, better wetting characteristics, do not leave residues or adversely affect photoresist adhesion, and retain their surface-active properties after 0.2 m filtration. .

Cyclopolysiloxanes: Cyclopolysiloxanes. Williams, Robert E., Jr. (General Electric Co., USA). U.S. US 4412080 A 25 Oct 1983, 4 pp. (English). (United States of America). CODEN: USXXAM. CLASS: IC: C07F007-08. NCL: 556460000. APPLICATION: US 82-408103 16 Aug 1982. DOCUMENT TYPE: Patent CA Section: 29 (Organometallic and Organometalloidal Compounds) Cyclic polysiloxanes (Me2SiO)m (I; m = 3-6) were prepd. by hydrolyzing Me2SiCl2 with n-C6-16 alkanesulfonic acids and aq. HCl at 0-100°. Thus, treating Me2SiCl2 with Me(CH2)5SO3Na (0.5 wt. %) and 36% aq. HCl at 35° gave 47% I (m = 4) and 13% I (m = 5). Use of n-C10H21SO3Na and higher temps. gave higher yields of I (m = 5) and I (m = 6).Except for chemicals metioned above, 2832-45-3 and 556-67-2 are also used. .