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Detail of "29690-82-2"

  • MSDS Download
  • CAS Number:
  • 29690-82-2
  • Name:
  • o-Cresol, formaldehyde, epichlorohydrin polymer

  • Molecular Structure:
  • Formula:
  • C11H15ClO3
  • Molecular Weight:
  • 230.69
  • Synonyms:
  • Epoxy cresol novolac;o-Cresol, polymer with 1-chloro-2,3-epoxypropane and formaldehyde;Epichlorohydrin, o-cresol, formaldehyde polymer;o-Cresol, 1-chloro-2,3-epoxypropane, formaldehyde polymer;Formaldehyde, polymer with (chloromethyl)oxirane and 2-methylphenol;
  • Boiling Point:
  • 191 °C at 760 mmHg
  • Flash Point:
  • 81.1 °C

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CAS No.29690-82-2 o-Cresol, formaldehyde, epichlorohydrin polymer

29690-82-2 Name: o-Cresol, formaldehyde, epichlorohydrin polymer Formula: C11H15ClO3 Molecular Structure: Synonyms: Epoxy cresol novolac;o-Cresol, polymer with 1-chloro-2,3-epoxypropane and formaldehyde;Epichlorohydrin, o-cresol, formaldehyde polymer;o-Cresol, 1-chloro-2,3-epoxy

Supplier:TIANJIN COOKMAN CHEMICAL IMP & EXP CO.,LTD. [ China (Mainland)]

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CAS No.29690-82-2 o-Cresol, formaldehyde, epichlorohydrin polymer

o-Cresol, formaldehyde, epichlorohydrin polymer

Supplier:tianjin xintaimei chemical co, ltd. [ China (Mainland)]

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Address:Tianjin

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CAS No.29690-82-2 o-Cresol, formaldehyde, epichlorohydrin polymer

Supplier:Hangzhou Share Chemical Co., Ltd [ China (Mainland)]

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CAS No.29690-82-2 o-Cresol, formaldehyde, epichlorohydrin polymer

Epoxy cresol novolac (Araldite?ECN 1280 base) CAS 29690-82-2 Uses: Hardener

Supplier:Vantico Inc [ United States]

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Tel:914-785-3317

Address:281 Fields Lane, Brewster, NY, 10509, USA

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CAS No.29690-82-2 o-Cresol, formaldehyde, epichlorohydrin polymer

Epoxy cresol novolac (Araldite?ECN 1280 base) CAS 29690-82-2 Uses: Hardener

Supplier:Vantico AG [ Switzerland]

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Tel:41 61 966 3091

Address:Klybeckstrasse 200, 4002 Basel, Switzerland

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CAS No.29690-82-2 o-Cresol, formaldehyde, epichlorohydrin polymer

Supplier:Whyte Chemicals [ United Kingdom]

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Tel:+44 (20) 8346-5946

Address:Marlborough House 298 Regents Park Road Finchley,London N3 2UA

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Reference

Phenolic resins containing unsaturated imide groups and derivatives
Phenolic resins containing unsaturated imide groups and derivatives. (Hitachi, Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 59157109 A2 6 Sep 1984 Showa, 5 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: C08G008-28; H01B003-36. APPLICATION: JP 83-29456 25 Feb 1983. DOCUMENT TYPE: Patent CA Section: 37 (Plastics Manufacture and Processing) Section cross-reference(s): 38, 76 Title resins I (R = H, Me, CMe3, Ph; X = CH:CH, 2-norbornene-5,6-diyl, 1-cyclohexene-4,5-diyl, methyl-2-norbornene-5,6-diyl) are used to prep. epoxy resin compns. suitable for embedding semiconductors. Thus, a novolak epoxy resin ECN 1273 [29690-82-2], a condensation product (prepd. from phthalimidomethylphenol and hexamethylenetetramine], Ph3P, epoxysilane coupling agent KBM 403, fused quartz powder, mold-release agent Hoechst Wax E, and carbon black were mixed to give a compn. which was used to embed MOS-type LSI elements.
Phenolic resins containing imidazole rings
Phenolic resins containing imidazole rings. (Hitachi, Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 59157110 A2 6 Sep 1984 Showa, 6 pp. (Japanese). (Japan). CODEN: JKXXAF.Several reagents such as 29690-82-2 is used here. CLASS: IC: C08G008-28; H01B003-36. APPLICATION: JP 83-29457 25 Feb 1983. DOCUMENT TYPE: Patent CA Section: 37 (Plastics Manufacture and Processing) Section cross-reference(s): 38, 76 Title resins I (R, R1 = C1-17 alkyl, Ph; m = 1-10; n = 1-10; m + n < 11) are prepd. and used to make epoxy resin compns. with good resistance to moisture and thermal shock, which are suitable for embedding semiconductors and for making adhesives of high bonding strength in manuf. of Cu-clad laminates. Thus, a resin prepd. from a phenolic novolak and 2-phenyl-4,5-bis(hydroxymethyl)imidazole, novolak epoxy resin ECN 1273 [29690-82-2], epoxy silane coupling agent KBM 403, quartz powder, mold-release agent Hoechst Wax E, and carbon black were mixed to give a compn. which was used to embed MOS-type LSI elements by transfer molding. .
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