Reference

Positively photosensitive resin composition

Positively photosensitive resin composition. Shr, Jiun-An; Shiu, Bo-Yi; Sheng, Pei-Hua (Chi Mei Corporation, Taiwan). Taiwan TW 554252 B 21 Sep 2003, 2 pp. (Chinese). (Taiwan). CODEN: TWXXA5. CLASS: ICM: G03F007-038. APPLICATION: TW 2001-90104597 27 Feb 2001. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) This invention provides a pos. photosensitive resin compn. applied to manuf. of liq. crystal display comprising (1) novolac resin (A), prepd. 31127-54-5 and 53252-02-1 are also in the experiment. by mixing 5-40 wt.% o-cresol, 20-80 wt.% m-cresol, and 10-60 wt.% p-cresol, and (2) a photosensitizer of esters of o-naphthoquinone diazide sulfonate (B), including esters of 1,2-naphthoquinone diazide-5-sulfonic acid having an av. degree of esterification larger than 80% (B-1), and esters of 2,3,4,4'-tetrahydroxybenzophenone having an av. degree of esterification larger than 80% (B-2). .

Postive-working photoresist compositions

Postive-working photoresist compositions. Miura, Konoe; Ochiai, Tameichi; Kameyama, Yasuhiro (Mitsubishi Chemical Industries Co., Ltd., Japan). Ger. Offen. DE 3603372 A1 14 Aug 1986, 14 pp. (Germany) CODEN: GWXXBX. CLASS: ICM: G03F007-08. ICS: G03C001-72; G03C001-495. ICA: C08L061-06; C08J003-28; H01L021-312; H01L021-72. APPLICATION: DE 86-3603372 5 Feb 1986. PRIORITY: JP 85-25660 13 Feb 1985. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Pos. 100346-90-5 and 31127-54-5 are also in the experiment.-working photoresist compns. showing a high sensitivity and being capable of producing an extremely good pattern profile are composed of a 2,3,4,4'-tetrahydroxybenzophenone 1,2-naphthoquinonediazide-5-sulfonate with 32 of the OH groups esterified and a novolak resin obtained through condensation of m-cresol, p-cresol, and 2,5-xylol with HCHO. Thus, a compn. contg. a m-cresol-p-cresol-HCHO-2,5-xylol novolak resin 3, 2,3,4,4'-tetrahydroxybenzophenone tris(1,2-naphthoquinone-2-diazide-5-sulfonate) 0.77 g, and Et cellosolve acetate 10 mL was filtered, coated on a Si wafer, exposed, and developed to get both an excellent sensitivity and pattern profile. .