Detail of "3406-84-6"

Reference

Coupling and capping reactions on poly(2,6-dimethyl-1,4-phenylene oxide)

Coupling and capping reactions on poly(2,6-dimethyl-1,4-phenylene oxide). White, D. M.; Loucks, G. R. (GE Res. Dev. Cent., Schenectady, NY 12301, USA). Polym. Prepr. (Am. Chem. Soc., Div.Several substances with their cas registry numbers 24938-67-8 and 3406-84-6 may be metioned in this study. Polym. Chem.), 25(1), 129-30 (English) 1984. CODEN: ACPPAY. ISSN: 0032-3934. DOCUMENT TYPE: Journal CA Section: 35 (Chemistry of Synthetic High Polymers) A method involved the use of a phase-transfer catalysts (quaternary ammonium halide) and aq. NaOH for the reaction of a capping agent, such as Ac2O [108-24-7], or a coupling agent, such as isophthaloyl chloride [99-63-8], bisphenol A bis(chloroformate) [2024-88-6], or POCl3, with the terminal OH groups of poly(2,6-dimethyl-1,4-phenylene oxide) (I) oligomers. Block copolymers were also prepd. by this method, using a polymeric coupling agent and a polymer which contained 2 OH end groups/mol. and was prepd. by heating I oligomers with 3,3',5,5'-tetramethyl-4,4'-diphenoquinone (by-product of the prepn. of I). .

Positive-working photoresist composition and method for pattern formation using the same

Positive-working photoresist composition and method for pattern formation using the same. Inabe, Haruki; Kanna, Shinichi (Fuji Photo Film Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 2005025150 A2 27 Jan 2005, 84 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: ICM: G03F007-004. ICS: G03F007-039; H01L021-027. APPLICATION: JP 2003-298910 22 Aug 2003. PRIORITY: JP 2003-163958 9 Jun 2003. 831204-32-1 and 3406-84-6 are cas registry numbers of chemicals which are used as reagents here. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) The title compn. contains a resin alkali-solubilizable by an reaction with an acid, an radiation- or actinic ray-sensitive acid-generator, and a dissoln.-inhibitor, wherein the dissoln.-inhibitor is stable under actinic ray and heat and has 32 sulfonate group, which generate sulfonic acids by reacting with an acid and are connected with an arom. ring or polycycloalkyl rings. The compn. is suitable for ￡250 nm exposure light and shows large soly. contrast for the development. .