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Detail of > 36451-09-9

  • CAS Number:
  • 36451-09-9
  • Name:
  • 1-Naphthalenesulfonylchloride, 3-diazo-3,4-dihydro-4-oxo-

  • Superlist Name:
  • 2-Diazo-1-naphthol-4-sulfonyl chloride
  • Formula:
  • C10H5ClN2O3S
  • Molecular Structure:
  • Synonyms:
  • 1,2-Naphthoquinone-2-diazide-4-sulfonylchloride;1,2-Naphthoquinonediazide-4-sulfonic acid chloride;1,2-Naphthoquinonediazide-4-sulfonyl chloride;2-Diazo-1,2-dihydro-1-oxo-4-naphthalenesulfonyl chloride;3-Diazo-3,4-dihydro-4-oxo-1-naphthalenesulfonyl chloride;
  • Molecular Weight:
  • 270.69
  • EINECS:
  • 253-042-9
  • Transport Information:
  • UN 3222
  • Deleted CAS:
  • 114749-73-4,23573-24-2
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36451-09-9 2-Diazo-1-naphthol-4-sulfonyl chloride

Assay:98%
China (Mainland)   ISO  4490
  • Tel:+86-571-88938639
  • Address:B/2601 Fuli Building, 328# WenEr Rd. Hangzhou City 310012 China

CAS No. 

36451-09-9 2-Diazo-1-naphthol-4-sulfonyl chloride

2-Diazo-1-naphthol-4-sulfonyl chloride
China (Mainland)   2295
  • Tel:0086-531-58773055
  • Address:NO.59 Gongye South Road

CAS No. 

36451-09-9 2-Diazo-1-naphthol-4-sulfonyl chloride

Appearance:White powder MF:C6H7FN2O2 MW:158.13 MP:182~183℃
China (Mainland)   2912
  • Tel:0351-7436719
  • Address:Shuangta South Alley 46,2-1, YingZe Area,Taiyuan, ShanXi
MSN:zhuofang.2008@hotmail.com

CAS No. 

36451-09-9 2-Diazo-1-naphthol-4-sulfonyl chloride

214-Sulphochloride; 2,1,4-Sulfochloride; NAC-4  CAS NO.(36451-09-9)  Chemical Name: 2-Diazo-1-naphthol-4-sulphochloride 1, 2-Naphthoquinone-2-diazo-4-sulfonyl chloride
China (Mainland)  
  • Tel:+86-21-3604 0647 +86-21-36040402
  • Address:No.1 Fulian 3rd Road,Baoshan district,Shanghai,China

CAS No. 

36451-09-9 2-Diazo-1-naphthol-4-sulfonyl chloride

CAS No.: 36451-09-9 Chemical name: 2-diazo-1-naphthol-4-sulfonyl chloride Molecular formula:C10H5ClN2O3S Molecular weight:268.68 Structural formula: Properties: yellow crystalline powder Uses:PS plate photosensitizing glue , photoresist Quality standard: I
China (Mainland)   4
JINTAI BIOCOMPOUNDS CO.,LIMITED
  • Tel:86-755-81240788
  • Address:Floor 17-5, Fiyta building,Southern District of Hi-tech Park, Shenzhen,China.

CAS No. 

36451-09-9 2-Diazo-1-naphthol-4-sulfonyl chloride

CAS No.: 36451-09-9 Chemical name: 2-diazo-1-naphthol-4-sulfonyl chloride Molecular formula:C10H5ClN2O3S Molecular weight:268.68 [ 2-Diazo-1-Naphthol-4-Sulfonyl Chloride ] CAS No.: 36451-09-9 Chemical name: 2-diazo-1-naphthol-4-sulfonyl chloride Molecular formula:C10H5C
China (Mainland)   2
  • Tel:+86-414-5898932
  • Address:37 N. zhengjia road xihu district , Benxi, Liaoning, China

CAS No. 

36451-09-9 2-Diazo-1-naphthol-4-sulfonyl chloride

Sepcification ≥96%
China (Mainland)  
  • Tel:86-311-8523-5112 86-311-8551-8832
  • Address:613# B YingBan Commercial Building 129 NanXiao Street ShiJiaZhuang HeBei China

CAS No. 

36451-09-9 2-Diazo-1-naphthol-4-sulfonyl chloride

Germany  
  • Tel:+49 (0) 20 56 / 98 33-0
  • Address:42579 Heiligenhaus

CAS No. 

36451-09-9 2-Diazo-1-naphthol-4-sulfonyl chloride

China (Mainland)   114
  • Tel:+86-755-28148255
  • Address:Add: 8th floor , No.2, An Hua Plaza, No. 1466, Longhua Road, Hi-tech Zone, Shenzhen, China

CAS No. 

36451-09-9 2-Diazo-1-naphthol-4-sulfonyl chloride

China (Mainland)  
  • Tel:+86-024-83780728
  • Address:No.24 Shiji road Hunnan industrial district Shenyang Liaoning P.R. China

CAS No. 

36451-09-9 2-Diazo-1-naphthol-4-sulfonyl chloride

China (Mainland)   2
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    Reference

    Photopolymerizable photoimaging material for producing color proof
    Photopolymerizable photoimaging material for producing color proof. Taniguchi, Tetsuya; Sasa, Nobumasa; Konuma, Tomohito; Hiraoka, Saburo; Masuda, Tetsuya; Mochizuki, Hideaki (Konishiroku Photo Ind; Mitsubishi Chem Corp, Japan). Jpn. Kokai Tokkyo Koho JP 08262704 A2 11 Oct 1996 Heisei, 28 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: ICM: G03F007-004. ICS: G03F003-10; G03F007-022; G03F007-027; G03F007-34; G03F007-38. APPLICATION: JP 1995-91570 24 Mar 1995. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) The title material comprises a photosensitive image forming layer on a support via a peelable (cushion) layer, where the image forming layer is capable of being transferred onto an image-receptor and the material satisfies a specific image-brightness relation and a specific image color relation (CIELAB). The photosensitive image-forming layer may contain 1,2-naphthoquinonediazido-4-sulfonyl chloride and/or 1,2-naphthoquinonediazido-5-sulfonyl chloride, a photoinitiator, a carboxylic acid vinyl ester polymer, a novolak resin.In this experiment, several chemicals are used like 36451-09-9 and 26355-01-1 The image-forming layer may contain photopolymerizable microcapsules. .
    Developer solution for photosensitive printing plates
    Developer solution for photosensitive printing plates. Matsumoto, Hiroshi (Fuji Photo Film Co., Ltd. , Japan). Ger. Offen. DE 3315395 A1 3 Nov 1983, 16 pp. (German). (Germany). CODEN: GWXXBX. CLASS: IC: G03F007-08. APPLICATION: DE 83-3315395 28 Apr 1983. PRIORITY: JP 82-72913 30 Apr 1982.In this article, certain chemicals are used. Some of their cas registry numbers are 1312-76-1 and 36451-09-9 DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) A developer soln. for o-quinonediazide printing plates which does not form insol. residues which clog the sprayer holes consists of an alkali silicate soln. and a chelating agent for Ca and/or Mg which is selected from aminopolycarboxylic, org. phosphinic, and phosphonotricarboxylic acids. Thus, an oxidized Al plate was coated with a soln. of a 1,2-naphthoquinone-2-diazide-5-sulfonic acid ester of an acetone-pyrogallol resin, HCHO-p-octylphenol resin, a cresol-HCHO resin, 1,2-naphthoquinone-2-diazide-4-sulfonyl chloride, and tetrahydrophthalic acid anhydride in 2-methoxyethyl acetate and MeCOEt to 2.5 g/m2. The plate was exposed and then spray developed with a dild. soln. of K silicate, KOH, and NTA Na salt. This was repeated using the same soln. for 20 days without clogging the sprayer holes. .

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