Detail of "37434-06-3"

Reference

Photosensitive compositions

Photosensitive compositions. Tsucha, Katsunori; Uchimura, Shunichiro; Koibuchi, Shigeru; Isobe, Asao; Makino, Daisuke (Hitachi Chemical Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 61260238 A2 18 Nov 1986 Showa, 6 pp. (Japan) CODEN: JKXXAF. 37434-06-3 is the cas registry number. This chemical is also mentioned in this article. CLASS: ICM: G03C001-71. ICS: G03F007-08. APPLICATION: JP 85-103043 15 May 1985. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Section cross-reference(s): 76 Photosensitive compns. contain aq. alkali-sol. polymers, siloxane ladder polymers, and arom. azido compds. The compns. show excellent dry-etching and heat resistance and are suitable for prodn. of semiconductor elements. Thus, cresol novolak 10, ethylcellosolve acetate 120, 4'-azidobenzal-2-ethoxyacetophenone 2, and GR-100 [poly(ladder siloxane); I (R, R1 = Me, Ph; ratio of Me/Ph is 2:1)] 0.5 part were mixed to obtain a compn., which was coated onto a polyimide layer formed on an Al substrate and dried to form a 0.8-m film. The film was irradiated with UV radiation through a quartz mask and developed with aq. KOH to obtain a good resist pattern, which did not get affected by O plasma etching. .