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Quinonediazido-type sulfonic acid derivatives

Quinonediazido-type sulfonic acid derivatives. (Nippon Carbide Industries Co., Inc., Japan). Jpn. Kokai Tokkyo Koho JP 59172455 A2 29 Sep 1984 Showa, 7 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: C07C143-68; C07C143-77. APPLICATION: JP 83-44476 18 Mar 1983. DOCUMENT TYPE: Patent CA Section: 37 (Plastics Manufacture and Processing) Section cross-reference(s): 25, 74 Quinonediazido-type sulfonic acid derivs. were prepd. by the esterification or amidation reaction of quinonediazido-type sulfonic acid chlorides with phenols or with arom. amines in the presence of guanidines as HCl scavengers. The photosensitive products are useful in photoresists. Thus, 27 g Me2NC(:NH)NMe2 [80-70-6] was added to a mixt. of 52 g 1,2-naphthoquinone-2-diazido-5-sulfonic acid chloride [3770-97-6] and 15 g 2,3,4-(HO)3C6H2COPh [1143-72-2] in dioxane during 45 min at 23° with cooling to give 95% 2,3,4-trihydroxybenzophenone tris[1,2-naphthoquinone-2-diazido-5-sulfonic acid ester]-(2,3,4) [5610-94-6]. Similarly prepd. were 2,3,4-trihydroxybenzoquinone tris[1,2-benzoquinone-2-diazido-4-sulfonic acid ester]-(2,3,4) [95833-27-5] and 3-(1,2-naphthoquinone-2-diazido-5-sulfonyl)amino-N-ethylcarbazole [23034-56-2].

Photosensitive printing plates

Photosensitive printing plates.Some chemicals with cas registry numbers like 9003-05-8 and 3770-97-6 are also used. Iwaki, Akio; Suzuki, Akihiko (Konishiroku Photo Industry Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 61230150 A2 14 Oct 1986 Showa, 11 pp. (Japan) CODEN: JKXXAF. CLASS: ICM: G03F007-02. APPLICATION: JP 85-72217 4 Apr 1985. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Photosensitive printing plates contain photosensitive layers coated from photosensitive compns. contg. finely powd. substances insol. in the coating solvents and sol. in the developer solns. The plates show good developability and halftone dot quality. Thus, an Al plate was coated with a soln. contg. m-cresol-HCHO resin 1,2-naphthoquinone-2-diazido-5-sulfonate (25 mol% condensed) 3.5, m-cresol-HCHO resin 8.0, 1,2-naphthoquinone-2-diazido-5-sulfonyl chloride 0.15, p-octylphenol-HCHO resin 1,2-naphthoquinone-2-diazido-5-sulfonate (50 mol% condensed) 0.12, gelatin (av. particle size 10 m) 0.06, Oil Blue #603 0.2, and ethylene glycol mono-Et ether 100 g and dried 3 min at 85° to obtain a photosensitive printing plate (10003 ′ 800 mm; with a 2.7 g/m2 coating), which was combined with a pos. original, exposed with a metal halide lamp, and developed by soaking in 4% aq. Na2SiO3 to obtain a lithog. printing plate. This plate was then used in an offset press to obtain many prints with clear images. .