Detail of "39612-01-6"
- CAS Number:
- 39612-01-6
- Name:
2-Propenoic acid,2-methyl-, tetrahydro-2-furanyl ester, homopolymer (9CI)
- Molecular Structure:
- Formula:
- C8 H12 O3
- Molecular Weight:
- 156.1791
- Synonyms:
- Poly(tetrahydro-2-furanylmethacrylate); Poly(tetrahydrofuryl methacrylate)
- Density:
- 1.05g/cm3
- Boiling Point:
- 209.4°Cat760mmHg
- Flash Point:
- 79.1°C
2-Propenoic acid,2-methyl-, tetrahydro-2-furanyl ester, homopolymer (9CI)
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Reference
- Far ultraviolet photoresist and its use for pattering
- Far ultraviolet photoresist and its use for pattering. Hayashi, Keiichi; Kurata, Nobuyuki; Kikuchi, Hideo (Toyo Gosei Kogyo Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 04026850 A2 30 Jan 1992 Heisei, 19 pp. (Japan). CODEN: JKXXAF. CLASS: ICM: G03F007-039. ICS: C08K003-16; C08K005-42; C08L033-14; G03F007-38; H01L021-027. APPLICATION: JP 90-131238 23 May 1990. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) The title photoresist compn. contains a compd. which yields an acid on irradn. and a polymer contg. the structural unit (I) [R1 = H, Me; n = 3,4]. 39612-01-6 is also in the experiment. Patterning is effected by patternwise exposing a film of the above compn., heating at 35-150°, and developing. The photoresist compn. is sensitive to UV below 300 nm and is useful in lithog., color proofing, color filter prodn., and integrated circuit and photomask fabrication. .