Reference

Ink compositions for ink-jet recording

Ink compositions for ink-jet recording. (Tokyo Ohka Kogyo Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 58176271 A2 15 Oct 1983 Showa, 6 pp.Chemicals with cas numbers 13822-56-5 and 1760-24-3 also play role. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: C09D011-00. APPLICATION: JP 82-59584 12 Apr 1982. DOCUMENT TYPE: Patent CA Section: 42 (Coatings, Inks, and Related Products) The title ink compns. comprise a silicone resin, dye, conductive agent, surfactant, and solvent contg. alcs. and/or ketones. Thus, iso-PrOH 74, silicone resin KR-214 17.4, KBM 603 N-(b-aminoethyl-g-aminopropyltrimethoxysilane] [1760-24-3] 5, NaSCN 1.8, Oil black HBB [4197-25-5] 1, and KP-340 modified silicone resin 0.8 part were blended to give an ink compn. having excellent adhesion (viscosity 4.82 cP). .

Polymerization of ethylenically unsaturated monomers

Polymerization of ethylenically unsaturated monomers. Koyanagi, Shunichi; Kitamura, Hajime; Shimizu, Toshihide; Fushimi, Kenji (Shin-Etsu Chemical Industry Co., Ltd., Japan). Ger. Offen. DE 2635780 24 Feb 1977, 30 pp. (German). (Germany). CODEN: GWXXBX. CLASS: IC: C08F002-44. PRIORITY: JP 75-98784 14 Aug 1975.In this article, certain chemicals are used. Some of their cas registry numbers are 62563-54-6 and 2429-82-5 DOCUMENT TYPE: Patent CA Section: 36 (Plastics Manufacture and Processing) The walls of polymn. reactors were treated with an electron donor and/or an electron acceptor and treated with an oxidizing agent, reducing agent, acid, or base or exposed to UV light to prep. coatings which minimize the formation of polymer deposits on the walls during the manuf. of rubber latexes, poly(vinyl acetate) [9003-20-7] latexes, PVC [9002-86-2] suspensions, etc. The electron donor was Sudan Black B (I) [4197-25-5], Nigrosine base [8005-02-5], diaminonaphthalene [38096-30-9], or a similar compd., and the electron acceptor was Nigrosine [8005-03-6], sulfoanthraquinone [30637-95-7], Amaranth [915-67-3], or a similar compd. Thus, the walls of a polymn. reactor were treated with a MeOH soln. of 1 part I and 1 part Nigrosine, followed by treatment with ethylenediamine and heating at 90.degree. for 30 min. No deposits of polymer were formed on the walls during the prepn. of a butadiene-styrene copolymer latex. .