Detail of "4766-57-8"

Reference

Manufacture of ethylene polymers

Manufacture of ethylene polymers. (Asahi Chemical Industry Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 59074105 A2 26 Apr 1984 Showa, 20 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: C08F004-00; C08F210-16. APPLICATION: JP 82-178283 13 Oct 1982. DOCUMENT TYPE: Patent CA Section: 35 (Chemistry of Synthetic High Polymers) Polyethylene [9002-88-4] or ethylene-C3-18 a-olefin copolymers are prepd. by polymn. in an inert solvent at 3130° using a Ziegler catalyst, deactivating the residual catalyst using a nonvolatile silane (RO)nSiR4-n1 (R = C1-20 hydrocarbon; R1 = H, C1-20 hydrocarbon; n = 1-4), and removing the volatile unreacted monomer(s) and solvent from the reaction mixt. In this method, the recovered monomer(s) and solvent are recycled without any adverse effect on the catalyst efficiency, producing polymers with low polydispersity. Thus, 1.6 L 0.5M SiHCl3 soln. in hexane was treated with 0.45 L 0.9M Al0.15MgBu1.75(OBu)0.7 soln. in octane at 70° for 1 h, and with 0.7 g TiCl4 in 0.6 L hexane to give a solid contg. 0.5% Ti. Then, ethylene, together with Ti catalyst, 0.1 mM Et3Al [97-93-8] in cyclohexane, and H were continuously charged into a reactor at 25 kg/h, 1.0 g/h, 200 L/h, and 1 kg/h, resp., and polymd. at 200° and 80 kg/cm2. A polymer slurry, coming out of the reactor at ~20 kg/h and 80% yield, was treated with 2% (BuO)4Si [4766-57-8] soln. in cyclohexane at 40 mmol/h and sepd. from the unreacted monomer and solvent to give a product with melt index (ASTM D 1238) 2.1, d. 0.965, and polydispersity 3.3 contg. 2.1% polymers with mol. wt. ￡5000. The recovered monomer and solvent were recycled for 4 h without reducing the catalyst efficiency (at 21,200 polymer/g-catalyst). When MeOH was used as a deactivator, the polymn. stopped in 4 h after recycling.

Coating compositions for forming siliceous films

Coating compositions for forming siliceous films. (Tokyo Denshi Kagaku K. K., Japan). Jpn. Kokai Tokkyo Koho JP 59062675 A2 10 Apr 1984 Showa, 5 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: C09D003-82. ICA: C01B033-12. APPLICATION: JP 83-139220 29 Jul 1983. DOCUMENT TYPE: Patent CA Section: 42 (Coatings, Inks, and Related Products) Section cross-reference(s): 76 The title compns. are manufd. by adding P-contg. inorg. acids to mixts. of alkoxysilanes 1, carboxylic acids 2-5, and alcs. 2-10 mol, and allowing them to react, forming hydroxysilanes, until the alkoxysilane and carboxylic acid content falls to ￡20% of its initial value. The compns. form films of uniform thickness, with good abrasion and chem. resistance, useful as protective and insulating layers in electronic devices. Thus, 30 g 85.5% H3PO4 was added to a mixt. of (BuO)4Si [4766-57-8] 320, maleic acid [110-16-7] 232, and MeOH 128 g, which was then allowed to react 4 days at room temp. The resulting maleate ester-hydroxysilane soln. was dild., mixed with 5 g B2O3, then filtered, applied to a dry glass plate, and heat treated to give a hard siliceous film with uniform distribution of SiO2, P2O5, and B2O3.