Detail of "48180-65-0"

Reference

Photolysis of aromatic azides in the crystalline state

Photolysis of aromatic azides in the crystalline state. Yanin, A. M.; Karyakina, L. N.; Treushnikov, V. M.; Olejnik, A. V.; Sorin, E. L. (Gor'k. Gos. Univ., Gorkiy, USSR). Khim. Vys. Energ., 21(2), 164-8 (Russian) 1987. CODEN: KHVKAO. ISSN: 0023-1193. DOCUMENT TYPE: Journal CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Kinetics of photolysis and formation of the paramagnetic centers were studied in irradiated cryst. azides (arom. mono- and diazides which are widely used in lithog.).In this experiment, several chemicals are used like 48180-65-0 Formation of the long-lived radicals with asym. ESR spectrum takes place during photolysis of those azide mol. which in a real crystal network are next to the trapped O mols. .

Photosensitive composition, and pattern formation using the composition

Photosensitive composition, and pattern formation using the composition. Tadano, Keiko; Chokai, Minoru (Hitachi, Ltd.; Hitachi Chemical Co., Ltd. 48180-65-0 and 125792-04-3 are also occured in this study., Japan). Jpn. Kokai Tokkyo Koho JP 03145647 A2 20 Jun 1991 Heisei, 6 pp. (Japan). CODEN: JKXXAF. CLASS: ICM: G03F007-008. ICS: H01L021-027. APPLICATION: JP 89-282978 1 Nov 1989. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) In a neg.-working photosensitive compn. contg. an azido compd., sensitizer, and polymer, the azide compd. undergoes a chem. reaction by the sensitizer which have a low absorption coeff. of the exposure wavelength but absorbs at the exposure wavelength region), and comprises a coating film having an absorption coeff. 0.1-1.5 1 mm. A method for forming a fine pattern involves utilization of the above compn. By controlling the absorption, the size-controlling property is improved. .