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Detail of > 51851-37-7

  • MSDS Download
  • CAS Number:
  • 51851-37-7
  • Name:
  • 1H,1H,2H,2H-Perfluorooctyltriethoxysilane

  • Formula:
  • C14H19F13O3Si
  • Molecular Structure:
  • Synonyms:
  • 1,1,2,2-Tetrahydroperfluorooctyltriethoxysilane;Silane,triethoxy(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)-;2-Perfluorohexylethyltriethoxysilane;3,3,4,4,5,5,6,6,7,7,8,8,8-Tridecafluorooctyltriethoxysilane;Repell 2111;SIT 8175.0;Tridecafluoro-1,1,2,2-tetrahydrooctyltriethoxysilane;
  • Molecular Weight:
  • 510.36
  • EINECS:
  • 257-473-3
  • Density:
  • 1.324 g/cm3
  • Boiling Point:
  • 272.378 °C at 760 mmHg
  • Flash Point:
  • 118.5 °C
  • Hazard Symbols:
  • IrritantXi,FlammableF
  • Risk Codes:
  • 36/37/38
  • Safety:
  • 26-37-60Details
  • Deleted CAS:
  • 295329-01-0
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CAS No. 

51851-37-7 1H,1H,2H,2H-PerfluorooctyltriethoxysilaneCompetitive Product

1H,1H,2H,2H-PERFLUOROOCTYLTRIETHOXYSILANE
China (Mainland)   2882
  • Tel:+86-571-86818502
  • Address:5Fl. 501Room, Tower A, New Youth Plaza, 8 Jia Shan Road, Hangzhou, China
MSN:sagechem@hotmail.com

CAS No. 

51851-37-7 1H,1H,2H,2H-Perfluorooctyltriethoxysilane

1H,1H,2H,2H-Perfluorooctyltriethoxysilane
China (Mainland)   ISO  2354
  • Tel:+86-21-64279360
  • Address:Room 1006,Building 3,#58 East Xinjian Road, Shanghai ,201100,China,
MSN:lvxb999@hotmail.com

CAS No. 

51851-37-7 1H,1H,2H,2H-Perfluorooctyltriethoxysilane

PERFLUOROALKYLETHYLTRIETHOXYSILANE
China (Mainland)   ISO  3124
  • Tel:+86-21-54177116-805
  • Address:R1318 Greenland No. 3 Lane 58 Xinjian East Rd., Minhang
MSN:wandasilicon@msn.cn

CAS No. 

51851-37-7 1H,1H,2H,2H-Perfluorooctyltriethoxysilane

1H,1H,2H,2H-PERFLUOROOCTYLTRIETHOXYSILANE
China (Mainland)   1800
  • Tel:+86-571-89189769
  • Address:Room801 Building5,No.19 XinTang Road,HangZhou 312200, China

CAS No. 

51851-37-7 1H,1H,2H,2H-Perfluorooctyltriethoxysilane

Purity: >97%
United States  
  • Tel:+1 910-762-5800
  • Address:102 Orange Street

CAS No. 

51851-37-7 1H,1H,2H,2H-Perfluorooctyltriethoxysilane

China (Mainland)   500
  • Tel:86-21-50185988
  • Address:Room 520-522,No.135,Dongfang Road, Pudong New District, Shanghai, China

CAS No. 

51851-37-7 1H,1H,2H,2H-Perfluorooctyltriethoxysilane

China (Mainland)   12
  • Tel:010-51600645 58608265;57131961
  • Address:Beijing changping area connects center north pearl tower 2 buildings
  • Total:7 Page 1 of 1 1
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    Reference

    Multilayer laminated films, the self-assembled manufacture and electronic components therewith
    Multilayer laminated films, the self-assembled manufacture and electronic components therewith. Ono, Takashi; Fujii, Shunsuke (Mitsui Chemicals Inc., Japan). Jpn. Kokai Tokkyo Koho JP 2005007320 A2 13 Jan 2005, 11 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: ICM: B05D007-24. ICS: B32B009-00; B32B031-00; B82B001-00; B82B003-00. APPLICATION: JP 2003-175387 19 Jun 2003. DOCUMENT TYPE: Patent CA Section: 38 (Plastics Fabrication and Uses) Section cross-reference(s): 42 Title films are easily prepd. by spreading solns. contg. hydrocarbon chain-contg. Si compds. (A) and fluoro hydrocarbon chain-contg. Si compds. (B) on base plates and evapg. the solvents to periodically form alternate A and B laminated films. A glass plate was spin-coated with a soln. 16153-27-8 and 51851-37-7 which are cas registry numbers of substances are two of reagents here. contg. H2O, EtOH, dodecyltriethoxysilane (I), and 2-(perfluorooctyl)ethyltriethoxysilane (II) dried at 40° for 12 h to form a multilayered film consisting of alternate 3.39-nm I and 3.02-nm II films. .
    Substrates comprising a photocatalytic TiO2 layer
    Substrates comprising a photocatalytic TiO2 layer. Akarsu, Murat; Arpac, Ertugrul; Schmidt, Helmut (Institut fuer Neue Materialien Gemeinnuetzige G.m.b.H., Germany). PCT Int. Appl. WO 2004005577 A2 15 Jan 2004, 42 pp. DESIGNATED STATES: W: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW, AM, AZ, BY, KG, KZ, MD, RU; RW: AT, BE, BF, BJ, CF, CG, CH, CI, CM, CY, DE, DK, ES, FI, FR, GA, GB, GR, IE, IT, LU, MC, ML, MR, NE, NL, PT, SE, SN, TD, TG, TR. (German). (World Intellectual Property Organization). CODEN: PIXXD2. CLASS: ICM: C23C018-00. APPLICATION: WO 2003-EP7426 9 Jul 2003. PRIORITY: DE 2002-10230928 9 Jul 2002; DE 2002-10235803 5 Aug 2002. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Section cross-reference(s): 63, 67 Substrates comprising a photocatalytic layer contg. TiO2 which have an improved photocatalytic activity are produced using TiO2 particles which are optionally doped with metallic or non-metallic elements or compds. In order to protect the glass or plastic substrates, the photocatalytic layer has a concn. gradient of the TiO2 particles. Optionally, an organically modified, inorg. hybrid layer is provided between the substrate and the photocatalytic layer. The photocatalytic layers are esp. useful in medical and hygienic areas.Except for chemicals metioned above, 1314-35-8 and 51851-37-7 are also used. .

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