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Detail of > 5718-83-2

  • CAS Number:
  • 5718-83-2
  • Name:
  • 3-Thiazolidineaceticacid, 4-oxo-2-thioxo-

  • Superlist Name:
  • Rhodanine-3-acetic acid
  • Formula:
  • C5H5NO3S2
  • Molecular Structure:
  • Synonyms:
  • (4-Oxo-2-thioxo-1,3-thiazolidin-3-yl)aceticacid;(4-Oxo-2-thioxothiazolidin-3-yl)acetic acid;3-(Carboxymethyl)rhodanine;3-Rhodanineacetic acid;4-Oxo-2-thioxothiazolidine-3-acetic acid;N-(Carboxymethyl)rhodanine;NSC 40450;Rhodanine-N-acetic acid;
  • Molecular Weight:
  • 191.22
  • EINECS:
  • 227-220-1
  • Density:
  • 1.72 g/cm3
  • Melting Point:
  • 145-148 °C(lit.)
  • Boiling Point:
  • 375.4 °C at 760 mmHg
  • Flash Point:
  • 180.8 °C
  • Appearance:
  • pale yellow fine crystaline powder
  • Hazard Symbols:
  • IrritantXi
  • Risk Codes:
  • 36/37/38-41
  • Safety:
  • 26-36-39-25Details
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5718-83-2 Rhodanine-3-acetic acidCompetitive Product

Rhodanine-3-Acetic Acid
China (Mainland)   1460
  • Tel:+86-571-88162786
  • Address:F1003, 753 Shenhua Road, hangzhou, china

CAS No. 

5718-83-2 Rhodanine-3-acetic acid

Assay:98%
China (Mainland)   ISO  4490
  • Tel:+86-571-88938639
  • Address:B/2601 Fuli Building, 328# WenEr Rd. Hangzhou City 310012 China

CAS No. 

5718-83-2 Rhodanine-3-acetic acid

intermediate of Epalrestat
China (Mainland)   2002
  • Tel:+86-571-85395792
  • Address:607, North Zhongshan Road, Hangzhou 310000 China
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CAS No. 

5718-83-2 Rhodanine-3-acetic acid

China (Mainland)   1644
  • Tel:0571-28183299
  • Address:Room 608,Building B , Zhejiang University science park, #525 Xixi Road ,hangzhou,China.

CAS No. 

5718-83-2 Rhodanine-3-acetic acid

China (Mainland)   2162
  • Tel:+86-571-88062298
  • Address:Hengdian Industry Area, Dongyang, Zhejiang, China
MSN:chemline_06@hotmail.com

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5718-83-2 Rhodanine-3-acetic acid

China (Mainland)   1546
  • Tel:86- 0311- 66686013
  • Address:2 units,,no.16,Zhongjiliyu ,shijiazhuan
MSN:kydchem.tech@msn.cn

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5718-83-2 Rhodanine-3-acetic acid

United States   652
  • Tel:732.938.2777
  • Address:5012 Industrial Road Farmingdale, NJ 07727

CAS No. 

5718-83-2 Rhodanine-3-acetic acid

4-oxo-2-mercapto-thiazole-3-acetica acid
China (Mainland)   Manufacturer  2000
  • Tel:+86-317-3563899, 3563699
  • Address:168 Jinde Road, Cangzhou, Hebei, China

CAS No. 

5718-83-2 Rhodanine-3-acetic acid

Name: Rhodanine-3-acetic acid Synonyms: 4-Oxo-2-thioxo-3-thiazolidinylacetic acid Specification: Used as intermediate chemicals
China (Mainland)   888
  • Tel:+86-(574)-81110986
  • Address:No. 411, Building 3, Wante Business Centre, Hi-tech Zone

CAS No. 

5718-83-2 Rhodanine-3-acetic acid

CAS No.: 5718-83-2 MF: C5H5NO3S2 MW: 191.23 Specification: Enterprise standard Apperance: Pale yellow fine crystalline powder.
China (Mainland)   1420
  • Tel:+86-531-62318366
  • Address:Room 502 of Yidonghuayuan No.601 Huaxin Road Licheng District Jinan China

CAS No. 

5718-83-2 Rhodanine-3-acetic acid

(4-Oxo-2-thioxo-thiazolidin-3-yl)acetic acid
Germany   2
  • Tel:+49 3494 636983
  • Address:Chemiepark Bitterfeld-Wolfen, Areal A, Werkstattstrasse 10

CAS No. 

5718-83-2 Rhodanine-3-acetic acid

Assay 98%
China (Mainland)   2
  • Tel:+86-571-86949631
  • Address:Hangzhou

CAS No. 

5718-83-2 Rhodanine-3-acetic acid

RHODANINE-3-ACETIC ACID
United States  
  • Tel:561 743-8090
  • Address:1003 W. Indiantown Road, Suite 215 Jupiter, FL 33458

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5718-83-2 Rhodanine-3-acetic acid

China (Mainland)   138
  • Tel:+86-21-60490308
  • Address:100,JinYu Road, Pudong Shanghai , China

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5718-83-2 Rhodanine-3-acetic acid

China (Mainland)   132
  • Tel:+86-29-84511282
  • Address:Northwest Road ,sanqiao,xi'an

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5718-83-2 Rhodanine-3-acetic acid

China (Mainland)  
  • Tel:+86-024-83780728
  • Address:No.24 Shiji road Hunnan industrial district Shenyang Liaoning P.R. China

CAS No. 

5718-83-2 Rhodanine-3-acetic acid

United States   6
  • Tel:801-226-2018
  • Address:PO Box 277
  • Total:17 Page 1 of 1 1
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    Reference

    Effects of chemical treatments upon photosynthetic parameters in soybean seedlings
    Effects of chemical treatments upon photosynthetic parameters in soybean seedlings. Manning, David T.; Chen, Tsong Meng; Campbell, Andrew J.; Tolbert, N. E.; Smith, E. Wayne (Union Carbide Agric. Prod. Co., Inc., Research Triangle Park, NC 27709, USA). Plant Physiol., 76(4), 1055-9 (English) 1984. CODEN: PLPHAY. ISSN: 0032-0889. DOCUMENT TYPE: Journal CA Section: 5 (Agrochemical Bioregulators) Section cross-reference(s): 11 The effects of various chem. treatments upon photosynthesis, sol. leaf protein, CO2 compensation point, and leaf light transmission in soybean, Glycine max, seedlings were examd. following varying response periods after application at 14 to 17 days postemergence. N6-Benzyladenine (BA) [1214-39-7], 2-(4-chlorophenoxy)-2-methylpropanoic acid (CPMP) [882-09-7], (4-chlorophenoxy)acetic acid (CPA) [122-88-3], rhodanine-N-acetic acid (RAA) [5718-83-2], and 2,3,5-triiodobenzoic acid (TIBA) [88-82-4] significantly increased sol. protein and decreased senescence, measured by leaf light transmission, at CO2 concns. below the compensation point in a survival chamber. All compds. except BA significantly decreased transmission values under ambient atm. conditions. In statistically significant expts., applications of 3.49 mM CPMP increased net photosynthesis on a leaf area basis by an av. of 14.4% at all trifoliolate positions with increases generally requiring response periods of 3 12 days. RAA at 1.31 and 2.61 mM increased net photosynthesis by 19 to 36% following 13-day response periods. CPMP and other compds. tested had no effect upon the CO2 compensation point after 4- to 8-day response periods. The effects of CPMP and RAA upon net photosynthesis and sol. protein appeared to involve a combined stimulation of protein synthesis and an antisenescent effect. There were no indications that any of the photosynthetic changes obsd. resulted from direct differential effects upon ribulose bisphosphate carboxylase-oxygenase. The assays for sol. protein and light transmission responded more consistently to the chem. than did photosynthesis.
    Image recording material for laser printing
    Image recording material for laser printing. Koizumi, Shigeo; Ishiji, Yohei (Fuji Photo Film Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 2005091977 A2 7 Apr 2005, 33 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: ICM: G03F007-11. ICS: G03F007-00. APPLICATION: JP 2003-327318 19 Sep 2003. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Title recording material comprises a substrate having a hydrophilic surface, an intermediate layer contg.Some chemicals with cas registry numbers like 5718-83-2 are also used. at least one compd. having general structure I, and a photopolymerizable layer. .

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