Reference

Thermal printing material containing phenylsulfonyl phenol and naphthyl benzyl ether

Thermal printing material containing phenylsulfonyl phenol and naphthyl benzyl ether. Watanabe, Tsutomu; Iwasaki, Masayuki; Mitsuo, Hirofumi (Fuji Photo Film Co., Ltd., Japan). 613-62-7 which is the cas registry number of one of substances is just one of reagents here. 177325-75-6 and 613-62-7 are also occured in this study. Jpn. Kokai Tokkyo Koho JP 2003025737 A2 29 Jan 2003, 9 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: ICM: B41M005-30. ICS: B41M005-26. APPLICATION: JP 2001-219690 19 Jul 2001. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) The material comprises a support coated with a heat-sensitive layer contg. an electron-donative color former (A), 2,4-bis(phenylsulfonyl)phenol (B) as an electron-accepting compd., and 2-naphthyl benzyl ether (C) as a heat-meltable compd. at wt. ratio B/A 32 and C/B = 0.8-1.2. The material gives high d. images with good storage stability and chem. resistance. ..

Method for producing material containing sensitizer dispersed therein for thermal recording article and thermal recording article

Method for producing material containing sensitizer dispersed therein for thermal recording article and thermal recording article. Oda, Shigeru; Kawabata, Eiji; Mori, Takaaki; Tan, Tjang Kie; Sumitomo, Hiroshi; Nakagawa, Yoshito (Sanko Co., Ltd., Japan). PCT Int. Appl. WO 2005000596 A1 6 Jan 2005, 45 pp. DESIGNATED STATES: W: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW; RW: AT, BE, BF, BJ, CF, CG, CH, CI, CM, CY, DE, DK, ES, FI, FR, GA, GB, GR, IE, IT, LU, MC, ML, MR, NE, NL, PT, SE, SN, TD, TG, TR. (Japanese). (World Intellectual Property Organization). CODEN: PIXXD2.Several reagents with their cas registry numbers 54914-85-1 and 613-62-7 are used here. CLASS: ICM: B41M005-28. ICS: B41M005-34. APPLICATION: WO 2004-JP5074 8 Apr 2004. PRIORITY: JP 2003-180869 25 Jun 2003. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) A method for producing a material contg. a sensitizer dispersed therein, characterized in that a sensitizer for a thermal recording article in an aq. emulsifying and dispersing agent soln. is emulsified and converted to a fluid contg. fine particles while heating the soln. and melting the agent, and then rapidly cooling the resultant material contg. emulsified and dispersed fine particles to crystallize the particles, wherein said sensitizer is selected from the group consisting of 1,2-bis(phenoxy)ethane, 1,2-bis(3-methylphenoxy)ethane, 1,2-bis(4-methylphenoxy)ethane, p-benzylbiphenyl, di-p-methylbenzyl oxalate and b-naphthyl benzyl ether. The method allows the prodn. of a material in the form of fine particles contg. a sensitizer dispersed therein with good vol. efficiency in a short operating time, and said material is excellent in storage stability and can provide a thermal recording article which exhibits high sensitivity, is almost free from the stain of a ground portion, and exhibits good preservation stability of a recorded image. .