Detail of "62316-48-7"

CAS Number:
62316-48-7
Name:
Benzenesulfonic acid,2,2'-[(2-oxo-1,3-cyclopentanediylidene)dimethylidyne]bis[5-azido-, sodium salt(1:2)
Molecular Structure:
Formula:
C19H14 N6 O7 S2 . 2 Na
Molecular Weight:
618.51
Synonyms:
Benzenesulfonicacid, 2,2'-[(2-oxo-1,3-cyclopentanediylidene)dimethylidyne]bis[5-azido-,disodium salt (9CI)

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Photosensitive resin compositions: Photosensitive resin compositions. Kohashi, Takahiro; Nonogaki, Saburo; Hatano, Yoshio (Hitachi, Ltd., Japan). Japan. Kokai JP 51123628 28 Oct 1976 Showa, 5 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: G03C001-71. APPLICATION: JP 75-47523 21 Apr 1975. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic Processes) Photosensitive resin compns. contain .gtoreq.1 H2O-sol. arom. azide compd. selected from 2,5-bis(4-azido-2-sulfobenzylidene)cyclopentanone (I), 2,5-bis(4-azido-2-sulfocinnamylidene)cyclopentanone, and their salts. The photosensitive resin compns. exhibit good sensitivty, can be developed with H2O, and hence are useful for prepg. printing plates, photoresists, and cathode-ray tube phosphor screens. Thus, Na 4-azidobenzaldehyde-2-sulfonate 1.47 g (contg. .apprx.10 wt. % NaCl) was dissolved in H2O 34 mL, cyclopentanone 0.27 mL and NaOH 0.22 g added, kept overnight, filtered, and recrystd. from H2O to give the di-Na salt of I. The salt 5 parts was dissolved in H2O and added to an aq. soln. contg. poly(N-vinylpyrrolidone) 100 and Shinetsu Silicone KBM 603 (from Shinetsu Kagaku K.K.) 3 parts to give a photosensitive resin compn. having considerably higher sensitivity than a control contg.Except for chemicals metioned above, 62316-48-7 and 9003-39-8 are also used. di-Na 4,4'-diazidostilbene-2,2'-disulfonate instead of the di-Na salt of I. .