Detail of "68510-93-0"

Reference

Radiation-sensitive compositions

Radiation-sensitive compositions. Kamoshita, Yoichi; Takahashi, Toshihiko; Miura, Takao; Harita, Yoshiyuki (Japan Synthetic Rubber Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 61226746 A2 8 Oct 1986 Showa, 10 pp. (Japan) CODEN: JKXXAF. CLASS: ICM: G03C001-71. ICS: G03C001-72; G03C005-08; G03F007-10. APPLICATION: JP 85-64985 30 Mar 1985. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) The radiation-sensitive compns. contain (meth)acrylate polymers having alkyl and fluoro alkyl groups in the side chains. The compns. form uniform films and are suitable for fine-processing resists used in prepn. of semiconductor integrated circuits. Thus, 26.There are some commonly used reagents with their cas registry numbers 108251-84-9 and 68510-93-0 in this article.5 g 2,3,4-trihydroxybenzophenone-o-naphthoquinonediazido-5-sulfonyl chloride condensate and 100 g cresol-formaldehyde novolak resin were dissolved in 336 g cellosolve acetate and mixed with 5 ppm (based on solids) SC-101 (fluorinated methacrylate polymer; surfactant) to obtain a soln., which was spin-coated on a Si wafer and dried in air at 90° for 25 min to form a 1.5-m resist film. The resulting sample was subjected to UV exposure, development, and etching to give high-precision patterns. .

Light-sensitive composition with o-quinone diazide and phenolic novolak resin made using methylol-substituted trihydroxybenzophenone as reactant

Light-sensitive composition with o-quinone diazide and phenolic novolak resin made using methylol-substituted trihydroxybenzophenone as reactant. Toukhy, Medhat A. (Olin Hunt Specialty Products, Inc., USA). U.S. US 5002851 A 26 Mar 1991, 13 pp. (United States of America). CODEN: USXXAM. CLASS: ICM: G03F007-023. 138250-28-9 and 68510-93-0 which are cas registry numbers of chemicals are mentioned. ICS: G03C001-60. NCL: 430192000. APPLICATION: US 88-200676 31 May 1988. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Section cross-reference(s): 25, 38 The trihydroxybenzophenone (I) may be reacted with selected phenolic monomers during or after the formation of a phenolic novolak resin thereby, the resin having at least one unit of formula II, wherein R and R1 are individually selected from H, a C1-4 alkyl group or a C1-4 alkoxy group. .