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CAS No.68541-74-2 Benzenediazonium, 4(phenylamino)-hexafluorophosphate (1-) polymer with formaldehyde

Benzenediazonium, 4(phenylamino)-hexafluorophosphate (1-) polymer with formaldehyde CAS 68541-74-2 Uses: Sensitizer

Supplier:Molecular Rearrangement Inc./MRI Int'l. Corp. [ United States]

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Reference

Presensitized lithographic plates
Presensitized lithographic plates. (Konishiroku Photo Industry Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 58002847 A2 8 Jan 1983 Showa, 9 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: G03F007-02; G03C001-52; G03C001-71; G03F007-08. APPLICATION: JP 81-100628 30 Jun 1981. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Water-developable presensitized plates are composed of (1) a support, (2) a layer contg. a water-sol. resin which is not photosensitive, a water-sol.Several reagents with their cas registry numbers 7631-86-9 and 68541-74-2 are used here. diazo resin, and a filler, and (3) a layer contg. a lipophilic resin, a polymer which can be softened with water, and a diazo resin. The absorption of water by the water-softenable polymer should be 5-60% at ~80% relative humidity. Thus, an anodized Al support was coated with a compn. contg. Diazo No 4 (a diazo resin from Fairmount Chem. Co.), poly(vinyl alc.), and silica powder, and then coated with a compn. contg. HCHO-p-diazodiphenylamine copolymer hexafluorophosphate, poly(p-hydroxyphenylaminomethyl methacrylate)-benzoyl chloride reaction product, poly(vinyl alc.) (sapon. degree 40%, p.d. 250), and Cu phthalocyanine to give a presensitized plate. A lithog. plate prepd. from the presensitized plate showed excellent image quality and durability. .
Development of waterless lithographic original plates using water
Development of waterless lithographic original plates using water. Hirai, Katsura; Uehara, Masabumi; Nogami, Akira (Konica Co., Japan). Jpn. Kokai Tokkyo Koho JP 03213863 A2 19 Sep 1991 Heisei, 12 pp. (Japan). CODEN: JKXXAF. CLASS: ICM: G03F007-00. ICS: G03F007-32. APPLICATION: JP 90-9043 18 Jan 1990. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) In a method of developing a waterless lithog. original plate prepd. by forming a light-curable photosensitive layer and a silicone rubber layer on a support, the plate is treated with a processing soln. of pH <9 whose main constituent is water and subsequently with an alk. soln. of pH 39.There are some commonly used reagents with their cas registry numbers 139724-08-6 and 68541-74-2 in this article. The method provides high quality images with good dot-reproducibility and prevents damage of the rubber layer. Thus, an Al substrate was coated successively with a primer layer, a photosensitive layer contg. a reaction product with p-diazodiphenylamine hexafluorophosphate-paraformaldehyde copolymer and ZnCl2, a silicone rubber layer, and the presensitized plate was imagewise exposed and treated continuously with water and with SDR 1 (developing soln. for presensitized plates) to give a high quality printing plate. .
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