Detail of "69088-96-6"

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Positive-working photosensitive resin compositions and their relief patterns and optical devices having excellent transparency and high refractive index

Positive-working photosensitive resin compositions and their relief patterns and optical devices having excellent transparency and high refractive index. Suwa, Atsushi; Tomikawa, Masao (Toray Industries, Inc., Japan). Jpn. Kokai Tokkyo Koho JP 2003075997 A2 12 Mar 2003, 16 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: ICM: G03F007-004. ICS: C08G069-26; G02B001-04; G03F007-023; G03F007-037. APPLICATION: JP 2002-172430 13 Jun 2002. PRIORITY: JP 2001-189398 22 Jun 2001. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Section cross-reference(s): 38, 73 The compns. developable with alkalis contain (a) alkali-sol. polymers, (b) compds. bearing phenolic OH, (c) esterified quinonediazides, and (d) 31 inorg. particles with particle diam. 1-30 nm, selected from Al compds., Si compds., Sn compds., Ti compds., and Zr compds. The polymers may comprise (a1) novolaks and/or resol resins, (a2) homopolymers and/or copolymers of radically polymerizable monomers bearing phenolic OH or CO2H, or (a3) polymers based on structure units represented by [COR1(OH)p(CO2R3)mCONHR2(OH)qNH]n (R1 = C32-contg. org. group with valency 2-8; R2 = C32-contg. 69088-96-6 which is the cas registry number of some chemical is mentioned. org. group with valency 2-6; R3 = H, C1-20 org. group; n = 10-100,000 integer; n = 0, 1, 2; p, q = 0-4 integer; p + q > 0). The compns. are irradiated with UV and thermally treated to give heat-resistant resins relief patterns. Optical devices such as optical waveguides and lenses contg. the compns. are also claimed. .