Detail of "71449-78-0"

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Synthesis and characterization of bis(isopropenylphenoxy)alkanes and bis(vinylphenoxy)alkanes: two classes of highly reactive, photopolymerizable monomers

Synthesis and characterization of bis(isopropenylphenoxy)alkanes and bis(vinylphenoxy)alkanes: two classes of highly reactive, photopolymerizable monomers. Crivello, J. V.; Ramidas, A.Except for chemicals metioned above, 71449-78-0 is also used. (Dep. Chem.Several reagents such as 71449-78-0 is used here., Rensselaer Polytech. Inst., Troy, NY 12180, USA). J. Macromol. Sci., Pure Appl. Chem., A29(9), 753-74 (English) 1992. CODEN: JSPCE6. DOCUMENT TYPE: Journal CA Section: 35 (Chemistry of Synthetic High Polymers) A novel and facile synthesis of difunctional, arom. vinyl ether analogs is reported. These materials, which are conveniently prepd. by the condensation of 4-acetoxystyrene or 4-isopropenylphenyl acetate with Br(CH2)nBr (n = 4-6, 8, 10) in the presence of base, can be cationically polymd. using diaryliodonium or triarylsulfonium salts as photoinitiators to produce crosslinked polymers. Relative reactivities of the monomers toward cationic polymn. are studied using differential scanning photocalorimetry. The thermal stabilities of the polymers resulting from the photopolymn. of the difunctional, arom. vinyl ether analogs were studied using TGA. ..

Novel resist materials using acid amplifiers

Novel resist materials using acid amplifiers. Part II. 71449-78-0 which is the cas registry number is also used here. Noguchi, Soh; Arimitsu, Koji; Ichimura, Kunihiro; Kudo, Kazuaki; Ohfuji, Takeshi; Sasago, Masaru (Research Laboratory of Resources Utilization, Tokyo Institute of Technology, Yokohama 226, Japan). Journal of Photopolymer Science and Technology, 10(2), 315-316 (English) 1997 Technical Association of Photopolymers, Japan. CODEN: JSTEEW. ISSN: 0914-9244. DOCUMENT TYPE: Journal CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) A novel neg. working photoresist was developed using the acid amplifier which modify the soly. of the phenolic resin after the acidolytic reaction. The resist contained Novolak resin, [4-(phenylthio)phenyl]diphenylsulfonium hexafluoroantimonate and 15 mol% of a diol monotosylate. .