Detail of "727-99-1"

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2-(Trifluoromethyl)benzophenone

610 Integral
610

Tel:86-13912317792

Address:145#,changjin east road,changzhou, jiangsu, china 213141

600 Integral
600

Tel:+86-22-58195791 58195792 58195793

Address:Room 1805, Guohua Building, No.857 Dagunan Road,

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Photosensitive resin composition containing benzophenone derivative photopolymerization initiator, photosensitive element, method of forming resist pattern, and manufacture of printed circuit board: Photosensitive resin composition containing benzophenone derivative photopolymerization initiator, photosensitive element, method of forming resist pattern, and manufacture of printed circuit board. Sawabe, Masaru; Yori, Hanako (Hitachi Chemical Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 2004333939 A2 25 Nov 2004, 17 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: ICM: G03F007-029. ICS: G03F007-004; H05K003-06; H05K003-18. APPLICATION: JP 2003-130531 8 May 2003. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Section cross-reference(s): 35, 38 Disclosed is the photosensitive resin compn. comprising (a) a binder polymer, (b) a photopolymerizable compd. having an ethylenic unsatd. 727-99-1 and 28263-96-9 which are cas registry numbers of chemicals are mentioned. bond, and (c) a photopolymn. initiator, wherein the photopolymn. initiator is represented by (R1)a-C6H4-C(:O)-C6H4-(R2)b (R1,2 = haloalkyl; and a, b = integer 0-5). The photosensitive resin exhibited excellent space resoln. and photosensitivity. .