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Detail of > 76-16-4

  • MSDS Download
  • CAS Number:
  • 76-16-4
  • Name:
  • Ethane,1,1,1,2,2,2-hexafluoro-

  • Formula:
  • C2F6
  • Molecular Structure:
  • Synonyms:
  • Ethane,hexafluoro- (8CI,9CI);Ethyl hexafluoride;F 116;F 116 (fluorocarbon);FC 116;FC 1160;Freon 116;HFC 116;Hexafluoroethane;PFC 116;Perfluorocarbon 116;Perfluoroethane;R 116;
  • Molecular Weight:
  • 138.02
  • EINECS:
  • 200-939-8
  • Density:
  • 1.463 g/cm3
  • Melting Point:
  • -100 °C(lit.)
  • Boiling Point:
  • -78 °C(lit.)
  • Appearance:
  • colourless gas
  • Hazard Symbols:
  • IrritantXi
  • Safety:
  • 38Details
  • Transport Information:
  • UN 2193 2.2
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CAS No. 

76-16-4 Ethane,1,1,1,2,2,2-hexafluoro-

3N Moisture:<10ppmw Acidity as HCl:<1.0 ppmw Other Organics:<100ppmw 44 kg DOT 43.3 L CGA580 5N N2:<8.0 ppmv O2:<2.0 ppmv CH4:<1.0 ppmv CO:<1.0 ppmv CO2:<1.0 ppmv H2O:<1.0 ppmv Acidity as HF:<0.1 ppmw 44 kg DOT 43.3 L CGA660
China (Mainland)   2
  • Tel:+86-379-65867058
  • Address:Room 906 Tower A, Tomson Center No.228 Zhangyang Road, Puodong

CAS No. 

76-16-4 Ethane,1,1,1,2,2,2-hexafluoro-

Physical State at 20(Deg.C): Liquefied gas Color: Colorless Odor: No odor warning properties Molecular weight: 138 Melting Point (Deg.C): -101 Boiling point (Deg.C): -78.2 Critical temperature (Deg.C): 19.7 Vapour Pressure (Deg.C): 30 bar Relative density, gas (air=1): 4.
China (Mainland)   62
  • Tel:+86 379 65867059
  • Address:zhangyang Rd, shanghai

CAS No. 

76-16-4 Ethane,1,1,1,2,2,2-hexafluoro-

HEXAFLUOROETHANE
United States  
  • Tel:215 641 2700
  • Address:Equipment Technology Center 166 Keystone Drive Montgomeryville, PA 18936

CAS No. 

76-16-4 Ethane,1,1,1,2,2,2-hexafluoro-

India   10
  • Tel:+(91)-(79)-40084092/ 40084091
  • Address:No. 33, Amba Industrial Estate, Vatva, Vinzol Ring Road Ahmedabad, Gujarat - 382 445, India

CAS No. 

76-16-4 Ethane,1,1,1,2,2,2-hexafluoro-

United States   10
  • Tel:1-973-5646400
  • Address:343 Millburn Ave. Millburn, NJ 07041 United States

CAS No. 

76-16-4 Ethane,1,1,1,2,2,2-hexafluoro-

United States   10
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  • Address:91-163 Hanua St, Kapolei, HI 96707
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    Reference

    Study of the pyrolysis of trifluorobromomethane (Khladon 13V1) in various media
    Study of the pyrolysis of trifluorobromomethane (Khladon 13V1) in various media. Kulakov, V. G.; Poloznov, N. M.; Baratov, A. N. (Vses. Nauchno-Issled. Inst. Protivopozharnoi Oborony, Moscow, USSR). Probl. Goreniya Tusheniya Pozharov, Mater. Vses. Nauchno-Prakt. Konf., 4th, Meeting Date 1975, 32-3. Edited by: Ryabov, I. V. Vses. Nauchno-Issled. Inst. Protivopozharnoi Oborony: Moscow, USSR. (Russian) 1976. CODEN: 36RAAY. DOCUMENT TYPE: Conference CA Section: 50 (Propellants and Explosives) CBrF3 (Khladon 13B1) [75-63-8] vapors were introduced in amts. of 3-30% into a flow of O, air, or He at atm. pressure and 400-900°. The flow velocity of the gas mixt. was 5-400 cm3/min in a quartz tube, 77 mm long and 8 mm in diam. The contact time with the hot surface of the tube was 1-10 s. The decompn. of CBrF3 began at 450° and was complete at 900°. In O and air atms., the main decompn. products were Br, CO2, CF4 [75-73-0], and small amts. of CO; in inert atm., Br and C2F6 [76-16-4].
    Plasma polymerization of hexafluoroethane as CAP mechanism model system for polymer formation
    Plasma polymerization of hexafluoroethane as CAP mechanism model system for polymer formation. Masuoka, Toshio; Yasuda, Hirotsugu; Hirasa, Okihiko (Res. Inst. Polym. Text., Yatabe 305, Japan). Kenkyu Hokoku - Sen'i Kobunshi Zairyo Kenkyusho, (132), 13-18 (Japanese) 1982. CODEN: SKZHA8. ISSN: 0371-0807. DOCUMENT TYPE: Journal CA Section: 35 (Chemistry of Synthetic High Polymers) Section cross-reference(s): 42 Hexafluoroethane (I) [76-16-4] plasma polymn. in the presence of H2 was investigated as a model system of the CAP (competitive reactions between ablation and polymn.) mechanism for polymer formation onto solid substrates. Acceleration effect of polymer deposition rate (DR) with increase of H2/I ratio was obsd. in a magnetron auto-frequency discharge system and a tubular type of radio-frequency discharge system. However, at H2/I ratio >1.0, DR decreased. This could be explained by formation of extremely F-poor polymers according to ESCA results of the polymers. The DR increase with H2 addn. might be attributed to HF formation. DR distribution in the reactors in relation to wattage, local plasma intensity, and reactor design was also discussed.

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