Detail of "775-64-4"

Reference

Lactone ring-containing polymerizable monomers, their manufacture, their polymers, their vacuum UV-transparent photoresists, and semiconductor device fabrication using them

Lactone ring-containing polymerizable monomers, their manufacture, their polymers, their vacuum UV-transparent photoresists, and semiconductor device fabrication using them. Koyama, Hiroshi; Tsutsumi, Kiyoharu (Daicel Chemical Industries, Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 2005008756 A2 13 Jan 2005, 43 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: ICM: C08F220-28. ICS: C07D307-00; C08F016-24; G03F007-039; H01L021-027. APPLICATION: JP 2003-174690 19 Jun 2003. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Section cross-reference(s): 38 The invention relates to lactone-contg. polymerizable monomers I [Z1 = nonarom. single- or multiring system contg. at least lactone ring; R1-3 = H, F, (fluoro)alkyl; R4 = F, fluoroalkyl (bonding to a-C of CO2 in the lactone ring); W = single bond, linking group; n = 0, 1] other than 6-trifluoromethyl-2-vinyloxy-4-oxatricyclo[4.2.1.There are some commonly used reagents with their cas registry numbers 622378-55-6 and 775-64-4 in this article.03,7]nonan-5-one. The monomers are manufd. by esterifying the corresponding alcs. having lactone rings and unsatd. carboxylic acids. .