Detail of "82799-44-8"

CAS Number:
82799-44-8
Name:
2,4-Diethyl-9H-thioxanthen-9-one
Molecular Structure:
Formula:
C₁₇H₁₆OS
Molecular Weight:
268.37
Deleted CAS:
153859-04-2|162774-73-4
Synonyms:
Diethylthioxanthone;2,4-Diethylthioxanthone;9H-Thioxanthen-9-one,2,4-diethyl-;Kayacure DETX;Kayacure DETX-S;Speedcure DETX;
EINECS:
280-041-0
Density:
1.178 g/cm³
Melting Point:
66-70 ºC
Boiling Point:
427.9 ºC at 760 mmHg
Flash Point:
237.3 ºC
Solubility:
insoluble in water
Appearance:
pale yellow powder

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Photosensitive resin compositions: Photosensitive resin compositions. Araki, Yasuhiko; Matsuhi, Hajime; Danjo, Shigeru (Sekisui Chemical Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 61188533 A2 22 Aug 1986 Showa, 6 pp. (Japan) CODEN: JKXXAF.Some commonly used reagents like 3524-68-3 and 82799-44-8 are used in this experiment. CLASS: ICM: G03C001-00. ICS: C08F002-48; G03C001-68; G03F007-00. APPLICATION: JP 85-30008 18 Feb 1985. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) The claimed photosensitive resin compns. contain (1) a resin prepd. from a,b-unsatd. ethylenic monomers, (2) a,b-unsatd. ethylenic photocrosslinking agents, (3) thioxanthone or its alkyl or halo deriv., (4) 31 compd. of the formula p-R1NR2C6H4CO2R3 (R1, R2 = C1-3 alkyl; R3 = H, C￡18 alkyl), and (5) 31 2,4,5-triarylimidazolyl dimer. The photosensitive resin compns. show good sensitivity and good storage stability; hence they are useful as high-resoln. photoresists for electroforming processes. Thus, poly(Me methacrylate), pentaerythritol triacrylate, tetraethylene glycol diacrylate, 2,4-diethylthioxanthone, isoamyl p-dimethylaminobenzoate, 2-(2-chlorophenyl)-4,5-bis(emthoxyphenyl)imidazole dimer, ethyl violet and p-methoxyphenol were mixed in MeCOEt to give a photoresist soln. for electroplating resist pattern formation. .

Antireflection film and object having undergone antireflection treatment: Antireflection film and object having undergone antireflection treatment. Iijima, Tadayoshi (TDK Corporation, Japan). PCT Int. Appl. WO 2004011243 A1 5 Feb 2004, 32 pp. DESIGNATED STATES: W: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW; RW: AT, BE, BF, BJ, CF, CG, CH, CI, CM, CY, DE, DK, ES, FI, FR, GA, GB, GR, IE, IT, LU, MC, ML, MR, NE, NL, PT, SE, SN, TD, TG, TR. (Japanese). (World Intellectual Property Organization). CODEN: PIXXD2. CLASS: ICM: B32B007-02. ICS: B32B007-06; G02B001-10. APPLICATION: WO 2003-JP9499 25 Jul 2003. PRIORITY: JP 2002-222900 31 Jul 2002. DOCUMENT TYPE: Patent CA Section: 73 (Optical, Electron, and Mass Spectroscopy and Other Related Properties) Section cross-reference(s): 74 An antireflection film for transfer that excels in not only the effect of preventing the reflection of light of visible region but also resistance to solvents and is capable of providing the surface of an object of poor flexibility such as a board with an antireflection layer of uniform thickness by transfer; and an object having undergone antireflection treatment. 82799-44-8 and 50926-11-9 which are cas registry numbers of substances are two of reagents here. In particular, an antireflection film for transfer comprising support and, superimposed in sequence thereon, antireflection layer, the antireflection layer comprising low-refractive-index layer provided on the support and high-refractive-index layer provided on the low-refractive-index layer and having a refractive index higher than that of the low-refractive-index layer, and adhesive layer, wherein the high-refractive-index layer contains fine particles of metal oxide and a photopolymn. initiator and/or a photosensitizer, wherein the adhesive constituting the adhesive layer is one being curable by actinic energy rays, the high-refractive-index layer impregnated with portion of the adhesive and wherein the support can be detached from the antireflection layer. .

Detail of "82799-44-8"

2,4-Diethyl-9H-thioxanthen-9-one

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CAS No.82799-44-8 2,4-Diethyl-9H-thioxanthen-9-one

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CAS No.82799-44-8 2,4-Diethyl-9H-thioxanthen-9-one

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CAS No.82799-44-8 2,4-Diethyl-9H-thioxanthen-9-one

CAS No.82799-44-8 2,4-Diethyl-9H-thioxanthen-9-one

CAS No.82799-44-8 2,4-Diethyl-9H-thioxanthen-9-one

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CAS No.82799-44-8 2,4-Diethyl-9H-thioxanthen-9-one

CAS No.82799-44-8 2,4-Diethyl-9H-thioxanthen-9-one

CAS No.82799-44-8 2,4-Diethyl-9H-thioxanthen-9-one

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CAS No.82799-44-8 2,4-Diethyl-9H-thioxanthen-9-one

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