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Detail of "84494-81-5"

  • CAS Number:
  • 84494-81-5
  • Name:
  • p-(t-Butyldimethylsiloxy)styrene

  • Molecular Structure:
  • Formula:
  • C14H22OSi
  • Molecular Weight:
  • 234.41
  • Density:
  • 0.91 g/cm3
  • Boiling Point:
  • 266.033 °C at 760 mmHg
  • Flash Point:
  • 111.258 °C
  • Risk Codes:
  • 36/37/38
  • Safety:
  • 26-36/37/39 Details

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CAS No.84494-81-5 p-(t-Butyldimethylsiloxy)styrene

p-(t-BUTYLDIMETHYLSILOXY)STYRENE

Supplier:Shandong Wanda Organosilicon New Material Co., Ltd [ China (Mainland)]

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ISOManufacturer 2690Integral
2690

Tel:+86-21-54177116-805/ 54302881

Address:R1318 Greenland No. 3 Lane 58 Xinjian East Rd., Minhang

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CAS No.84494-81-5 p-(t-Butyldimethylsiloxy)styrene

Supplier:Hangzhou Dayangchem Co., Ltd. [ China (Mainland)]

Platinum
Supplier
ISO 3875Integral
3875

Tel:+86-571-88938639

Address:B/2601 Fuli Building, 328# WenEr Rd. Hangzhou City 310012 China

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Reference

Pattern-forming materials
Pattern-forming materials. (Japan Synthetic Rubber Co., Ltd., Japan). Jpn. 84494-81-5 are also occured in this study. Kokai Tokkyo Koho JP 60052845 A2 26 Mar 1985 Showa, 6 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: ICM: G03C001-71. ICS: G03F007-10. APPLICATION: JP 83-160259 2 Sep 1983. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Pattern-forming materials which are sensitive toward light or ionizing radiation have, as the main constituents, a polymer contg. a silyl group or groups and a compd. which generates a cation or anion upon irradn. with light or ionizing radiation. The materials provide pos.- or neg.-working resists by selecting the developer soln. and exhibit good dry-etch resistance. Thus, p-vinylphenoxy-tert-butyldimethylsilane prepd. from 4-vinylphenol and tert-butyldimethylsilyl chloride was polymd. in the presence of BuLi to give a polymer. A resist contg. the polymer and Ph3S+AsF6- was coated on a Si wafer, patternwise irradiated with an ionizing radiation, and then developed with 2-PrOH to obtain pos. patterns showing high resoln. .
Metallocene-mediated synthesis of chain-end functionalized polypropylene and application in PP/clay nanocomposites
Metallocene-mediated synthesis of chain-end functionalized polypropylene and application in PP/clay nanocomposites. Chung, T. C. (Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA 16802, USA). Journal of Organometallic Chemistry, 690(26), 6292-6299 (English) 2005 Elsevier B.V. CODEN: JORCAI. ISSN: 0022-328X. DOCUMENT TYPE: Journal CA Section: 35 (Chemistry of Synthetic High Polymers) Section cross-reference(s): 37 The prepn. of chain end functionalized isotactic polypropylene (PP) having a terminal functional group, such as Cl, OH, and NH2 is described. The metallocene-mediated propylene polymn. was carried out using rac-Me2Si[2-Me-4-Ph(Ind)]2ZrCl2/MAO complex as catalyst in the presence of styrene derivs. (St-f) and hydrogen, as chain transfer agents.There are some reagents like 84494-81-5 is used in this study.Except for chemicals metioned above, 84494-81-5 is also used. The mol. wt. of polypropylene (PP) with terminal Cl, OH, and NH2 group (i.e., PP-t-Cl, PP-t-OH and PP-t-NH2) is inversely proportional to the molar ratio of [St-f]/[propylene]. Despite the extremely low concn. of functional groups, the high mol. wt. chain end functionalized PP-t-OH and PP-t-NH+3 exhibit a distinctive advantage over other functional PP polymers contg. side chain functional groups or long functional blocks. The terminal hydrophilic OH and NH+3 cations, with good mobility and reactivity, effectively hydrogen bond and ion-exchange the cations (Li+, Na+, etc.) located between clay interlayers. Such interactions anchor the PP chain to the clay surfaces. The rest of the unperturbed end-tethered high mol. wt. PP tail exfoliates the clay layers. This exfoliated structure is maintained even after further mixing of PP-bearing platelets with pure neat PP polymers. ..
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