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Detail of "95418-58-9"

  • CAS Number:
  • 95418-58-9
  • Name:

  • Benzene,1-(1,1-dimethylethoxy)-4-ethenyl-

  • Superlist Name:
  • 4-tert-Butoxystyrene
  • Molecular Structure:
  • Formula:
  • C12H16O
  • Molecular Weight:
  • 176.26
  • Synonyms:
  • 4-t-Butoxystyrene;p-tert-Butoxystyrene;1-tert-Butoxy-4-vinylbenzene;tert-Butyl 4-ethenylphenyl ether;
  • Density:
  • 0.933 g/cm3
  • Melting Point:
  • -38 °C(lit.)
  • Boiling Point:
  • 256.8 °C at 760 mmHg
  • Flash Point:
  • 97.1 °C
  • Hazard Symbols:
  • IrritantXi
  • Risk Codes:
  • 36/37/38
  • Safety:
  • 26-36 Details
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CAS No.95418-58-9 4-tert-Butoxystyrene

Supplier:Changzhou Ansciep Chemical Co.,Ltd. [ China (Mainland)]

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CAS No.95418-58-9 4-tert-Butoxystyrene

Assay:99.5%  Appearance:powder  Package:25kg/Cardboa...Storage:1-10MT

Supplier:Henan Tianfu Chemical Co., Ltd. [ China (Mainland)]

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CAS No.95418-58-9 4-tert-Butoxystyrene

Assay:98%

Supplier:Hangzhou Dayangchem Co., Ltd. [ China (Mainland)]

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CAS No.95418-58-9 4-tert-Butoxystyrene

Supplier:Shijiazhuang JuSha Imp. & Exp. Co., Ltd [ China (Mainland)]

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CAS No.95418-58-9 4-tert-Butoxystyrene

Supplier:KindChem Co.,Ltd, [ China (Mainland)]

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CAS No.95418-58-9 4-tert-Butoxystyrene

Supplier:Chang Zhou Chemistar Chemistry Technology Co.,Ltd [ China (Mainland)]

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CAS No.95418-58-9 4-tert-Butoxystyrene

p-tert-Butoxystyrene

Supplier:HOKKO Chemical Industry Co.,Ltd. [ Japan]

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CAS No.95418-58-9 4-tert-Butoxystyrene

Supplier:Nanjing FineTech Chemical Co.,Ltd. [ China (Mainland)]

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CAS No.95418-58-9 4-tert-Butoxystyrene

Supplier:Legendchemistry technology co., ltd [ China (Mainland)]

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Reference

Photoresist compositions containing substituted organomethyl vinylaryl ether materials
Photoresist compositions containing substituted organomethyl vinylaryl ether materials. Crivello, James V. (General Electric Co., USA). U.S. US 4603101 A 29 Jul 1986, 5 pp. (United States of America) CODEN: USXXAM. CLASS: ICM: G03C001-76. NCL: 430270000. APPLICATION: US 85-780768 27 Sep 1985. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) The title photosensitive compn. comprises a polymer of 4-tert-butoxy-a-methylstyrene or 4-tert-butoxystyrene units, a photoinitiator from a diaryliodonium salt or triarylsulfonium salt, and an inert org. solvent. Thus, poly(4-tert-butoxystyrene) (I) was prepd. by Grignard reaction of 4-chlorostyrene followed by reaction with tert-Bu perbenzoate and polymn. Then, a Si wafer was coated with a compn. contg. I 0.5, di(tert-butylphenyl)iodonium trifluoromethanesulfonate 0.1 g, and glyme 7 mL.In this experiment, several chemicals are used like 95418-58-9 and 105649-65-8 The wafer was used to obtain a well defined pos. image. .
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