Welcome to LookChem.com Sign In|Join Free

CAS

  • or

194999-82-1

Post Buying Request

194999-82-1 Suppliers

Recommended suppliersmore

  • Product
  • FOB Price
  • Min.Order
  • Supply Ability
  • Supplier
  • Contact Supplier

194999-82-1 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 194999-82-1 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 1,9,4,9,9 and 9 respectively; the second part has 2 digits, 8 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 194999-82:
(8*1)+(7*9)+(6*4)+(5*9)+(4*9)+(3*9)+(2*8)+(1*2)=221
221 % 10 = 1
So 194999-82-1 is a valid CAS Registry Number.

194999-82-1SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 19, 2017

Revision Date: Aug 19, 2017

1.Identification

1.1 GHS Product identifier

Product name diphenyliodanium,1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate

1.2 Other means of identification

Product number -
Other names Diphenyliodonium perfluoro-1-butanesulfonate

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:194999-82-1 SDS

194999-82-1Upstream product

194999-82-1Downstream Products

194999-82-1Relevant articles and documents

Novel anthracene derivative and radiation-sensitive resin composition

-

, (2008/06/13)

A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), wherein R1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

Chemical amplification type positive resist compositions and sulfonium salts

-

, (2008/06/13)

A chemical amplifying type positive resist composition having high transmittance, superior in sensitivity and resolution in a lithography utilizing a light having a wavelength of 220 nm or lower and confering a good profile is provided, Which comprisesan

Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1

What can I do for you?
Get Best Price

Get Best Price for 194999-82-1